Issued Patents All Time
Showing 1–25 of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12397435 | Substrate location detection and adjustment | Michael J. Martin, Yuhou Wang | 2025-08-26 |
| 12322579 | Metal contamination reduction in substrate processing systems with transformer coupled plasma | Maolin Long, Neema Rastgar | 2025-06-03 |
| 12300463 | Method and system for automated frequency tuning of radiofrequency (RF) signal generator for multi-level RF power pulsing | Mathew Evans, Ying Wu | 2025-05-13 |
| 12261029 | Protection system for switches in direct drive circuits of substrate processing systems | Maolin Long, Yuhou Wang, Michael J. Martin | 2025-03-25 |
| 12165841 | Dual-frequency, direct-drive inductively coupled plasma source | Maolin Long, Yuhou Wang | 2024-12-10 |
| 12119232 | Etching isolation features and dense features within a substrate | Juline Shoeb, Ying Wu | 2024-10-15 |
| 12057319 | Selective silicon dioxide removal using low pressure low bias deuterium plasma | Juline Shoeb | 2024-08-06 |
| 12046450 | Synchronization of RF generators | Ying Wu, John Drewery, Xiang Zhou, Zhuoxian Wang, Yoshie Kimura | 2024-07-23 |
| 11887819 | Systems for cooling RF heated chamber components | Jon McChesney, Saravanapriyan Sriraman, Richard A. Marsh, John Holland | 2024-01-30 |
| 11728137 | Direct frequency tuning for matchless plasma source in substrate processing systems | Yuhou Wang, Maolin Long, Ying Wu | 2023-08-15 |
| 11538666 | Multi-zone cooling of plasma heated window | Yiting Zhang, Richard A. Marsh, Saravanapriyan Sriraman | 2022-12-27 |
| 11495441 | Systems for cooling RF heated chamber components | Jon McChesney, Saravanapriyan Sriraman, Richard A. Marsh, John Holland | 2022-11-08 |
| 11398387 | Etching isolation features and dense features within a substrate | Juline Shoeb, Ying Wu | 2022-07-26 |
| 11056321 | Metal contamination reduction in substrate processing systems with transformer coupled plasma | Maolin Long, Neema Rastgar | 2021-07-06 |
| 11011351 | Monoenergetic ion generation for controlled etch | Juline Shoeb, Ying Wu | 2021-05-18 |
| 10957521 | Image based plasma sheath profile detection on plasma processing tools | Yuhou Wang, Michael J. Martin, Jon McChesney | 2021-03-23 |
| 10879044 | Auxiliary circuit in RF matching network for frequency tuning assisted dual-level pulsing | Yuhou Wang, Arthur H. Sato, Ying Wu | 2020-12-29 |
| 10847345 | Direct drive RF circuit for substrate processing systems | Maolin Long | 2020-11-24 |
| 10825661 | Systems for cooling RF heated chamber components | Jon McChesney, Saravanapriyan Sriraman, Richard A. Marsh, John Holland | 2020-11-03 |
| 10651013 | Systems and methods for tuning to reduce reflected power in multiple states | Jon McChesney | 2020-05-12 |
| 10541168 | Edge ring centering method using ring dynamic alignment data | Ali Sucipto Tan, Haoquan Yan, Marc Estoque, Damon Tyrone Genetti, Jon McChesney | 2020-01-21 |
| 10515781 | Direct drive RF circuit for substrate processing systems | Maolin Long | 2019-12-24 |
| 10410836 | Systems and methods for tuning to reduce reflected power in multiple states | Jon McChesney | 2019-09-10 |
| 10262867 | Fast-gas switching for etching | Saravanapriyan Sriraman | 2019-04-16 |
| 10249511 | Ceramic showerhead including central gas injector for tunable convective-diffusive gas flow in semiconductor substrate processing apparatus | Saravanapriyan Sriraman | 2019-04-02 |