Issued Patents All Time
Showing 526–550 of 625 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7531404 | Semiconductor device having a metal gate electrode formed on an annealed high-k gate dielectric layer | Sangwoo Pae, Jose Maiz, Justin K. Brask, Gilbert Dewey, Robert S. Chau +1 more | 2009-05-12 |
| 7525160 | Multigate device with recessed strain regions | Justin K. Brask, Suman Datta, Brian S. Doyle, Robert S. Chau | 2009-04-28 |
| 7521775 | Protection of three dimensional transistor structures during gate stack etch | Brian S. Doyle, Uday Shah, Been-Yih Jin | 2009-04-21 |
| 7518196 | Field effect transistor with narrow bandgap source and drain regions and method of fabrication | Robert S. Chau, Suman Datta, Justin K. Brask, Mark L. Doczy, Matthew V. Metz | 2009-04-14 |
| 7514346 | Tri-gate devices and methods of fabrication | Robert S. Chau, Brian S. Doyle, Douglas Barlage, Suman Datta, Scott A. Hareland | 2009-04-07 |
| 7504678 | Tri-gate devices and methods of fabrication | Robert S. Chau, Brian S. Doyle, Douglas Barlage, Suman Datta | 2009-03-17 |
| 7501336 | Metal gate device with reduced oxidation of a high-k gate dielectric | Brian S. Doyle, Justin K. Brask, Matthew V. Mertz, Mark L. Doczy, Suman Datta +1 more | 2009-03-10 |
| 7494862 | Methods for uniform doping of non-planar transistor structures | Brian S. Doyle, Robert S. Chau, Suman Datta | 2009-02-24 |
| 7485503 | Dielectric interface for group III-V semiconductor device | Justin K. Brask, Suman Datta, Mark L. Doczy, James M. Blackwell, Matthew V. Metz +1 more | 2009-02-03 |
| 7485536 | Abrupt junction formation by atomic layer epitaxy of in situ delta doped dopant diffusion barriers | Been-Yih Jin, Brian S. Doyle, Robert S. Chau | 2009-02-03 |
| 7479421 | Process for integrating planar and non-planar CMOS transistors on a bulk substrate and article made thereby | Justin K. Brask, Brian S. Doyle, Uday Shah, Suman Datta, Mark L. Doczy +2 more | 2009-01-20 |
| 7473947 | Process for ultra-thin body SOI devices that incorporate EPI silicon tips and article made thereby | Anand S. Murthy, Brian S. Doyle, Robert S. Chau | 2009-01-06 |
| 7470972 | Complementary metal oxide semiconductor integrated circuit using uniaxial compressive stress and biaxial compressive stress | Justin K. Brask, Mark L. Doczy, Matthew V. Metz, Suman Datta, Brian S. Doyle +7 more | 2008-12-30 |
| 7465976 | Tunneling field effect transistor using angled implants for forming asymmetric source/drain regions | Matthew V. Metz, Gilbert Dewey, Ben Jin, Justin K. Brask, Suman Datta +1 more | 2008-12-16 |
| 7456068 | Forming ultra-shallow junctions | Mark Liu, Suman Datta | 2008-11-25 |
| 7449373 | Method of ion implanting for tri-gate devices | Brian S. Doyle, Suman Datta, Amlan Majumdar | 2008-11-11 |
| 7449756 | Semiconductor device with a high-k gate dielectric and a metal gate electrode | Matthew V. Metz, Suman Datta, Mark L. Doczy, Justin K. Brask, Robert S. Chau | 2008-11-11 |
| 7445980 | Method and apparatus for improving stability of a 6T CMOS SRAM cell | Suman Datta, Brian S. Doyle, Robert S. Chau, Bo Zheng, Scott A. Hareland | 2008-11-04 |
| 7442983 | Method for making a semiconductor device having a high-k gate dielectric | Mark L. Doczy, Gilbert Dewey, Suman Datta, Sangwoo Pae, Justin K. Brask +4 more | 2008-10-28 |
| 7439571 | Method for fabricating metal gate structures | Mark L. Doczy, Mark Liu, Justin K. Brask, Matthew V. Metz, Robert S. Chau | 2008-10-21 |
| 7439113 | Forming dual metal complementary metal oxide semiconductor integrated circuits | Mark L. Doczy, Mitchell Taylor, Justin K. Brask, Suman Datta, Matthew V. Metz +2 more | 2008-10-21 |
| 7435683 | Apparatus and method for selectively recessing spacers on multi-gate devices | Uday Shah, Willy Rachmady, Brian S. Doyle | 2008-10-14 |
| 7435987 | Forming a type I heterostructure in a group IV semiconductor | Chi On Chui, Prashant Majhi, Wilman Tsai | 2008-10-14 |
| 7429747 | Sb-based CMOS devices | Mantu K. Hudait, Suman Datta, Mark L. Doczy, Robert S. Chau | 2008-09-30 |
| 7427794 | Tri-gate devices and methods of fabrication | Robert S. Chau, Brian S. Doyle, Douglas Barlage, Suman Datta, Scott A. Hareland | 2008-09-23 |