Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12302632 | Non-planar integrated circuit structures having mitigated source or drain etch from replacement gate process | Jun Sung Kang, Kai Loon Cheong, Biswajeet Guha, William Hsu, Dax M. Crum +2 more | 2025-05-13 |
| 12284826 | Fin end plug structures for advanced integrated circuit structure fabrication | Byron Ho, Chun-Kuo HUANG, Jeanne Luce, Michael L. Hattendorf, Christopher P. Auth +1 more | 2025-04-22 |
| 11961838 | Fin end plug structures for advanced integrated circuit structure fabrication | Byron Ho, Chun-Kuo HUANG, Jeanne Luce, Michael L. Hattendorf, Christopher P. Auth +1 more | 2024-04-16 |
| 11869973 | Nanowire transistor structure and method of shaping | Aditya Kasukurti, Jun Sung Kang, Kai Loon Cheong, Biswajeet Guha, William Hsu +1 more | 2024-01-09 |
| 11869891 | Non-planar integrated circuit structures having mitigated source or drain etch from replacement gate process | Jun Sung Kang, Kai Loon Cheong, Biswajeet Guha, William Hsu, Dax M. Crum +2 more | 2024-01-09 |
| 11563119 | Etchstop regions in fins of semiconductor devices | Cheng-Ying Huang, Willy Rachmady, Gilbert Dewey, Aaron D. Lilak, Jack T. Kavalieros | 2023-01-24 |
| 11443983 | Void-free high aspect ratio metal alloy interconnects and method of manufacture using a solvent-based etchant | Shaestagir Chowdhury, Sirikarn Surawanvijit, Biswadeep Saha | 2022-09-13 |
| 11380683 | Fin end plug structures for advanced integrated circuit structure fabrication | Byron Ho, Chun-Kuo HUANG, Jeanne Luce, Michael L. Hattendorf, Christopher P. Auth +1 more | 2022-07-05 |
| 10964800 | Semiconductor device having fin-end stress-inducing features | Byron Ho, Michael L. Hattendorf, Jeanne Luce, Ebony L. Mays | 2021-03-30 |
| 10861850 | Fin end plug structures for advanced integrated circuit structure fabrication | Byron Ho, Chun-Kuo HUANG, Jeanne Luce, Michael L. Hattendorf, Christopher P. Auth +1 more | 2020-12-08 |
| 10734379 | Fin end plug structures for advanced integrated circuit structure fabrication | Byron Ho, Chun-Kuo HUANG, Jeanne Luce, Michael L. Hattendorf, Christopher P. Auth +1 more | 2020-08-04 |
| 9472456 | Technology for selectively etching titanium and titanium nitride in the presence of other materials | Nabil G. Mistkawi, Rohit Grover | 2016-10-18 |