Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11538905 | Nanowire transistors employing carbon-based layers | Glenn A. Glass, Anand S. Murthy, Karthik Jambunathan, Tahir Ghani | 2022-12-27 |
| 11515304 | Integrated circuit devices with non-collapsed fins and methods of treating the fins to prevent fin collapse | Glenn A. Glass | 2022-11-29 |
| 10944006 | Geometry tuning of fin based transistor | Glenn A. Glass, Anand S. Murthy, Karthik Jambunathan, Chandra S. Mohapatra, Hei Kam +2 more | 2021-03-09 |
| 10833076 | Integrated circuit devices with non-collapsed fins and methods of treating the fins to prevent fin collapse | Glenn A. Glass | 2020-11-10 |
| 10755984 | Replacement channel etch for high quality interface | Glenn A. Glass, Ying-Feng PANG, Anand S. Murthy, Tahir Ghani, Huang-Lin Chao | 2020-08-25 |
| 10541334 | Techniques for integration of Ge-rich p-MOS source/drain | Glenn A. Glass, Anand S. Murthy, Tahir Ghani, Ying-Feng PANG | 2020-01-21 |
| 10147817 | Techniques for integration of Ge-rich p-MOS source/drain | Glenn A. Glass, Anand S. Murthy, Tahir Ghani, Ying-Feng PANG | 2018-12-04 |
| 9859424 | Techniques for integration of Ge-rich p-MOS source/drain contacts | Glenn A. Glass, Anand S. Murthy, Tahir Ghani, Ying-Feng PANG | 2018-01-02 |
| 9472456 | Technology for selectively etching titanium and titanium nitride in the presence of other materials | Erica J. Thompson, Rohit Grover | 2016-10-18 |
| 8426319 | Composition for etching a metal hard mask material in semiconductor processing | Lourdes Dominguez | 2013-04-23 |
| 8025811 | Composition for etching a metal hard mask material in semiconductor processing | Lourdes Dominguez | 2011-09-27 |