Issued Patents All Time
Showing 25 most recent of 86 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12426230 | Fin cut and fin trim isolation for advanced integrated circuit structure fabrication | Tahir Ghani, Byron Ho, Curtis W. Ward, Christopher P. Auth | 2025-09-23 |
| 12349450 | Trench plug hardmask for advanced integrated circuit structure fabrication | Anthony St. Amour, Christopher P. Auth | 2025-07-01 |
| 12284826 | Fin end plug structures for advanced integrated circuit structure fabrication | Byron Ho, Chun-Kuo HUANG, Erica J. Thompson, Jeanne Luce, Christopher P. Auth +1 more | 2025-04-22 |
| 12255247 | Trench contact structures for advanced integrated circuit structure fabrication | Subhash M. Joshi, Jeffrey S. Leib | 2025-03-18 |
| 12225740 | Dual metal silicide structures for advanced integrated circuit structure fabrication | Jeffrey S. Leib, Srijit Mukherjee, Vinay BHAGWAT, Christopher P. Auth | 2025-02-11 |
| 12199167 | Gate line plug structures for advanced integrated circuit structure fabrication | Byron Ho, Christopher P. Auth | 2025-01-14 |
| 12199168 | Plugs for interconnect lines for advanced integrated circuit structure fabrication | Andrew W. Yeoh, Ilsup JIN, Angelo Kandas, Christopher P. Auth | 2025-01-14 |
| 12165928 | Integrated circuits with recessed gate electrodes | Srijit Mukherjee, Christopher J. Wiegand, Tyler J. Weeks, Mark Liu | 2024-12-10 |
| 12142667 | Contact over active gate structures for advanced integrated circuit structure fabrication | Andrew W. Yeoh, Tahir Ghani, Atul MADHAVAN, Christopher P. Auth | 2024-11-12 |
| 12094955 | Confined epitaxial regions for semiconductor devices | Szuya S. Liao, Tahir Ghani | 2024-09-17 |
| 12057492 | Gate cut and fin trim isolation for advanced integrated circuit structure fabrication | Tahir Ghani, Byron Ho, Christopher P. Auth | 2024-08-06 |
| 12016170 | Fin cut and fin trim isolation for advanced integrated circuit structure fabrication | Tahir Ghani, Byron Ho, Curtis W. Ward, Christopher P. Auth | 2024-06-18 |
| 11961767 | Dual metal silicide structures for advanced integrated circuit structure fabrication | Jeffrey S. Leib, Srijit Mukherjee, Vinay BHAGWAT, Christopher P. Auth | 2024-04-16 |
| 11961838 | Fin end plug structures for advanced integrated circuit structure fabrication | Byron Ho, Chun-Kuo HUANG, Erica J. Thompson, Jeanne Luce, Christopher P. Auth +1 more | 2024-04-16 |
| 11955532 | Dual metal gate structure having portions of metal gate layers in contact with a gate dielectric | Jeffrey S. Leib, Jenny Hu, Anindya Dasgupta, Christopher P. Auth | 2024-04-09 |
| 11948997 | Trench contact structures for advanced integrated circuit structure fabrication | Subhash M. Joshi, Jeffrey S. Leib | 2024-04-02 |
| 11887838 | Trench plug hardmask for advanced integrated circuit structure fabrication | Anthony St. Amour, Christopher P. Auth | 2024-01-30 |
| 11881520 | Fin patterning for advanced integrated circuit structure fabrication | Curtis W. Ward, Heidi M. Meyer, Christopher P. Auth | 2024-01-23 |
| 11837456 | Continuous gate and fin spacer for advanced integrated circuit structure fabrication | Heidi M. Meyer, Ahmet TURA, Byron Ho, Subhash M. Joshi, Christopher P. Auth | 2023-12-05 |
| 11799015 | Gate cut and fin trim isolation for advanced integrated circuit structure fabrication | Tahir Ghani, Byron Ho, Christopher P. Auth | 2023-10-24 |
| 11664439 | Trench contact structures for advanced integrated circuit structure fabrication | Subhash M. Joshi, Jeffrey S. Leib | 2023-05-30 |
| 11646359 | Fin cut and fin trim isolation for advanced integrated circuit structure fabrication | Tahir Ghani, Byron Ho, Curtis W. Ward, Christopher P. Auth | 2023-05-09 |
| 11640985 | Trench isolation for advanced integrated circuit structure fabrication | Curtis W. Ward, Heidi M. Meyer, Tahir Ghani, Christopher P. Auth | 2023-05-02 |
| 11640988 | Confined epitaxial regions for semiconductor devices and methods of fabricating semiconductor devices having confined epitaxial regions | Szuya S. Liao, Tahir Ghani | 2023-05-02 |
| 11581420 | Contact over active gate structures for advanced integrated circuit structure fabrication | Andrew W. Veoh, Tahir Ghani, Atul MADHAVAN, Christopher P. Auth | 2023-02-14 |