| 12255247 |
Trench contact structures for advanced integrated circuit structure fabrication |
Subhash M. Joshi, Michael L. Hattendorf |
2025-03-18 |
|
| 12225740 |
Dual metal silicide structures for advanced integrated circuit structure fabrication |
Srijit Mukherjee, Vinay BHAGWAT, Michael L. Hattendorf, Christopher P. Auth |
2025-02-11 |
|
| 12051698 |
Fabrication of gate-all-around integrated circuit structures having molybdenum nitride metal gates and gate dielectrics with a dipole layer |
Daniel G. Ouellette, Daniel B. O'Brien, Orb Acton, Lukas Baumgartel, Dan S. LAVRIC +3 more |
2024-07-30 |
$27,313,000 |
| 11961767 |
Dual metal silicide structures for advanced integrated circuit structure fabrication |
Srijit Mukherjee, Vinay BHAGWAT, Michael L. Hattendorf, Christopher P. Auth |
2024-04-16 |
$37,256,000 |
| 11955532 |
Dual metal gate structure having portions of metal gate layers in contact with a gate dielectric |
Jenny Hu, Anindya Dasgupta, Michael L. Hattendorf, Christopher P. Auth |
2024-04-09 |
$27,197,000 |
| 11948997 |
Trench contact structures for advanced integrated circuit structure fabrication |
Subhash M. Joshi, Michael L. Hattendorf |
2024-04-02 |
$34,819,000 |
| 11664439 |
Trench contact structures for advanced integrated circuit structure fabrication |
Subhash M. Joshi, Michael L. Hattendorf |
2023-05-30 |
$16,378,000 |
| 11508626 |
Dual metal silicide structures for advanced integrated circuit structure fabrication |
Srijit Mukherjee, Vinay BHAGWAT, Michael L. Hattendorf, Christopher P. Auth |
2022-11-22 |
$12,862,000 |
| 11482611 |
Replacement gate structures for advanced integrated circuit structure fabrication |
Byron Ho, Steven Jaloviar, Michael L. Hattendorf, Christopher P. Auth |
2022-10-25 |
$11,792,000 |
| 11342445 |
Differentiated voltage threshold metal gate structures for advanced integrated circuit structure fabrication |
Jenny Hu, Anindya Dasgupta, Michael L. Hattendorf, Christopher P. Auth |
2022-05-24 |
$18,289,000 |
| 11088261 |
Trench contact structures for advanced integrated circuit structure fabrication |
Subhash M. Joshi, Michael L. Hattendorf |
2021-08-10 |
$36,027,000 |
| 11063151 |
Metal chemical vapor deposition approaches for fabricating wrap-around contacts and resulting structures |
Daniel Bergstrom, Christopher J. Wiegand |
2021-07-13 |
$34,958,000 |
| 11018222 |
Metallization in integrated circuit structures |
Daniel B. O'Brien, Christopher J. Wiegand, Lukas Baumgartel, Oleg Golonzka, Dan S. LAVRIC +3 more |
2021-05-25 |
$32,857,000 |
| 10957782 |
Trench contact structures for advanced integrated circuit structure fabrication |
Subhash M. Joshi, Michael L. Hattendorf |
2021-03-23 |
$29,278,000 |
| 10886383 |
Replacement gate structures for advanced integrated circuit structure fabrication |
Byron Ho, Steven Jaloviar, Michael L. Hattendorf, Christopher P. Auth |
2021-01-05 |
$27,050,000 |
| 10854732 |
Dual metal gate structures for advanced integrated circuit structure fabrication |
Jenny Hu, Anindya Dasgupta, Michael L. Hattendorf, Christopher P. Auth |
2020-12-01 |
$25,476,000 |
| 10840151 |
Dual metal silicide structures for advanced integrated circuit structure fabrication |
Srijit Mukherjee, Vinay BHAGWAT, Michael L. Hattendorf, Christopher P. Auth |
2020-11-17 |
$36,756,000 |
| 10796968 |
Dual metal silicide structures for advanced integrated circuit structure fabrication |
Srijit Mukherjee, Vinay BHAGWAT, Michael L. Hattendorf, Christopher P. Auth |
2020-10-06 |
$29,609,000 |
| 10790378 |
Replacement gate structures for advanced integrated circuit structure fabrication |
Byron Ho, Steven Jaloviar, Michael L. Hattendorf, Christopher P. Auth |
2020-09-29 |
$31,444,000 |
| 10741669 |
Differentiated voltage threshold metal gate structures for advanced integrated circuit structure fabrication |
Jenny Hu, Anindya Dasgupta, Michael L. Hattendorf, Christopher P. Auth |
2020-08-11 |
$37,011,000 |
| 10727313 |
Dual metal gate structures for advanced integrated circuit structure fabrication |
Jenny Hu, Anindya Dasgupta, Michael L. Hattendorf, Christopher P. Auth |
2020-07-28 |
$26,273,000 |
| 10297499 |
Method of forming a wrap-around contact on a semiconductor device |
Ralph T. Troeger, Daniel Bergstrom |
2019-05-21 |
$20,944,000 |
| 10121875 |
Replacement gate structures for advanced integrated circuit structure fabrication |
Byron Ho, Steven Jaloviar, Michael L. Hattendorf, Christopher P. Auth |
2018-11-06 |
$18,970,000 |
| 10096513 |
Direct plasma densification process and semiconductor devices |
Jason A. Farmer, Daniel Bergstrom |
2018-10-09 |
$20,353,000 |
| 9711399 |
Direct plasma densification process and semiconductor devices |
Jason A. Farmer, Daniel Bergstrom |
2017-07-18 |
$6,909,000 |
