Issued Patents All Time
Showing 26–50 of 69 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11404559 | Plugs for interconnect lines for advanced integrated circuit structure fabrication | Andrew W. Yeoh, Ilsup JIN, Angelo Kandas, Michael L. Hattendorf | 2022-08-02 |
| 11380683 | Fin end plug structures for advanced integrated circuit structure fabrication | Byron Ho, Chun-Kuo HUANG, Erica J. Thompson, Jeanne Luce, Michael L. Hattendorf +1 more | 2022-07-05 |
| 11342445 | Differentiated voltage threshold metal gate structures for advanced integrated circuit structure fabrication | Jeffrey S. Leib, Jenny Hu, Anindya Dasgupta, Michael L. Hattendorf | 2022-05-24 |
| 11322601 | Gate cut and fin trim isolation for advanced integrated circuit structure fabrication | Tahir Ghani, Byron Ho, Michael L. Hattendorf | 2022-05-03 |
| 11255620 | Water collection/deflection arrangement | Yohann Lilian Rousselet, Dina Malamud | 2022-02-22 |
| 11248859 | Water collection arrangement | Yohann Lilian Rousselet, Dina Malamud, Kevin Egolf, Lukasz Sztobryn | 2022-02-15 |
| 11227863 | Gate isolation in non-planar transistors | Leonard P. GULER, Gopinath Bhimarasetti, Vyom Sharma, Walid M. Hafez | 2022-01-18 |
| 11063133 | Fin cut and fin trim isolation for advanced integrated circuit structure fabrication | Tahir Ghani, Byron Ho, Curtis W. Ward, Michael L. Hattendorf | 2021-07-13 |
| 11031487 | Contact over active gate structures for advanced integrated circuit structure fabrication | Andrew W. Yeoh, Tahir Ghani, Atul MADHAVAN, Michael L. Hattendorf | 2021-06-08 |
| 11011616 | Gate line plug structures for advanced integrated circuit structure fabrication | Byron Ho, Michael L. Hattendorf | 2021-05-18 |
| 10985267 | Fin trim isolation with single gate spacing for advanced integrated circuit structure fabrication | Tahir Ghani, Byron Ho, Michael L. Hattendorf | 2021-04-20 |
| 10943817 | Etch-stop layer topography for advanced integrated circuit structure fabrication | Andrew W. Yeoh, Ruth A. Brain, Michael L. Hattendorf | 2021-03-09 |
| 10930753 | Trench isolation for advanced integrated circuit structure fabrication | Michael L. Hattendorf, Curtis W. Ward, Heidi M. Meyer, Tahir Ghani | 2021-02-23 |
| 10886383 | Replacement gate structures for advanced integrated circuit structure fabrication | Byron Ho, Steven Jaloviar, Jeffrey S. Leib, Michael L. Hattendorf | 2021-01-05 |
| 10861850 | Fin end plug structures for advanced integrated circuit structure fabrication | Byron Ho, Chun-Kuo HUANG, Erica J. Thompson, Jeanne Luce, Michael L. Hattendorf +1 more | 2020-12-08 |
| 10854732 | Dual metal gate structures for advanced integrated circuit structure fabrication | Jeffrey S. Leib, Jenny Hu, Anindya Dasgupta, Michael L. Hattendorf | 2020-12-01 |
| 10854731 | Heterogeneous metal line compositions for advanced integrated circuit structure fabrication | Andrew W. Yeoh, Joseph M. Steigerwald, Jinhong SHIN, Vinay Chikarmane | 2020-12-01 |
| 10840151 | Dual metal silicide structures for advanced integrated circuit structure fabrication | Jeffrey S. Leib, Srijit Mukherjee, Vinay BHAGWAT, Michael L. Hattendorf | 2020-11-17 |
| 10818774 | Plugs for interconnect lines for advanced integrated circuit structure fabrication | Andrew W. Yeoh, Ilsup JIN, Angelo Kandas, Michael L. Hattendorf | 2020-10-27 |
| 10796951 | Etch-stop layer topography for advanced integrated circuit structure fabrication | Andrew W. Yeoh, Ruth A. Brain, Michael L. Hattendorf | 2020-10-06 |
| 10796968 | Dual metal silicide structures for advanced integrated circuit structure fabrication | Jeffrey S. Leib, Srijit Mukherjee, Vinay BHAGWAT, Michael L. Hattendorf | 2020-10-06 |
| 10797047 | Gate isolation in non-planar transistors | Leonard P. GULER, Gopinath Bhimarasetti, Vyom Sharma, Walid M. Hafez | 2020-10-06 |
| 10790378 | Replacement gate structures for advanced integrated circuit structure fabrication | Byron Ho, Steven Jaloviar, Jeffrey S. Leib, Michael L. Hattendorf | 2020-09-29 |
| 10775117 | Water collection/deflection arrangements | Yohann Lilian Rousselet, Dina Malamud | 2020-09-15 |
| 10777655 | Heterogeneous metal line compositions for advanced integrated circuit structure fabrication | Andrew W. Yeoh, Joseph M. Steigerwald, Jinhong SHIN, Vinay Chikarmane | 2020-09-15 |