HH

Henning Haffner

Infineon Technologies Ag: 39 patents #169 of 7,486Top 3%
IBM: 11 patents #9,995 of 70,183Top 15%
AK Advanced Mask Technology Center Gmbh & Co. Kg: 1 patents #8 of 26Top 35%
📍 Dresden, NY: #4 of 24 inventorsTop 20%
Overall (All Time): #79,777 of 4,157,543Top 2%
40
Patents All Time

Issued Patents All Time

Showing 26–40 of 40 patents

Patent #TitleCo-InventorsDate
7354684 Test pattern and method of evaluating the transfer properties of a test pattern Uwe Dersch 2008-04-08
7304721 Method for dynamically monitoring a reticle Karin Eggers, Norbert Haase, Andreas Frangen, Carmen Jaehnert 2007-12-04
7221788 Method of inspecting a mask or reticle for detecting a defect, and mask or reticle inspection system Steffen Schulze 2007-05-22
7124379 Method for communicating a measuring position of a structural element that is to be formed on a mask Bettine Buechner, Christian Rotsch 2006-10-17
7094674 Method for production of contacts on a wafer Werner Graf, Johannes Kowalewski, Lars Heineck 2006-08-22
7056628 Mask for projecting a structure pattern onto a semiconductor substrate Shahid Butt 2006-06-06
6756164 Exposure mask with repaired dummy structure and method of repairing an exposure mask Torsten Franke, Armin Semmler, Martin Verbeek 2004-06-29
6631511 Generating mask layout data for simulation of lithographic processes Armin Semmler, Christoph Friedrich 2003-10-07
6586308 Method for producing circuit structures on a semiconductor substrate and semiconductor configuration with functional circuit structures and dummy circuit structures Sabine Kling, Dominique Savignac, Hans-Peter Moll, Elke Hietschold, Ines Anke 2003-07-01
6571383 Semiconductor device fabrication using a photomask designed using modeling and empirical testing Shahid Butt, Beate Frankowsky 2003-05-27
6436585 Method of using optical proximity effects to create electrically blown fuses with sub-critical dimension neck downs Chandrasekhar Narayan, Axel Brintzinger, Fred L. Einspruch, Alan C. Thomas 2002-08-20
6426269 Dummy feature reduction using optical proximity effect correction Heinz Hoenigschmid, Donald J. Samuels 2002-07-30
6421820 Semiconductor device fabrication using a photomask with assist features Scott M. Mansfield, Lars Liebmann, Shahid Butt 2002-07-16
6353248 Optimized decoupling capacitor using lithographic dummy filler Armin Reith, Louis L. Hsu, Gunther Lehmann 2002-03-05
6232154 Optimized decoupling capacitor using lithographic dummy filler Armin Reith, Louis L. Hsu, Gunther Lehmann 2001-05-15