Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7346885 | Method for producing a mask layout avoiding imaging errors for a mask | — | 2008-03-18 |
| 7011936 | Photomask and method of structuring a photoresist by double exposure with imaging auxiliary structures and different exposure tools | Christoph Nolscher, Gunther Czech | 2006-03-14 |
| 6756164 | Exposure mask with repaired dummy structure and method of repairing an exposure mask | Torsten Franke, Henning Haffner, Martin Verbeek | 2004-06-29 |
| 6631511 | Generating mask layout data for simulation of lithographic processes | Henning Haffner, Christoph Friedrich | 2003-10-07 |