Issued Patents All Time
Showing 26–40 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6187412 | Silicon article having columns and method of making | Peter D. Hoh, Son V. Nguyen | 2001-02-13 |
| 6139647 | Selective removal of vertical portions of a film | Steven A. Grundon, David L. Harmon, Donald M. Kenney | 2000-10-31 |
| 6090722 | Process for fabricating a semiconductor structure having a self-aligned spacer | Sandra G. Malhotra, Tina Wagner, Richard S. Wise | 2000-07-18 |
| 6051504 | Anisotropic and selective nitride etch process for high aspect ratio features in high density plasma | Richard S. Wise | 2000-04-18 |
| 5885899 | Method of chemically mechanically polishing an electronic component using a non-selective ammonium hydroxide slurry | David M. Dobuzinsky, Jeffery P. GAMBINO, Mark A. Jaso | 1999-03-23 |
| 5811357 | Process of etching an oxide layer | Tina Wagner, Michael L. Passow, Dominic J. Schepis, Matthew Sendelbach, William C. Wille | 1998-09-22 |
| 5767017 | Selective removal of vertical portions of a film | Steven A. Grundon, David L. Harmon, Donald M. Kenney | 1998-06-16 |
| 5766968 | Micro mask comprising agglomerated material | A. Richard Baker, Jr., Wayne S. Berry, Daniel Carl, Donald McAllpine Kenney, Thomas J. Licata | 1998-06-16 |
| 5759867 | Method of making a disposable corner etch stop-spacer for borderless contacts | Jeffrey P. Gambino | 1998-06-02 |
| 5714798 | Selective deposition process | Steven A. Grundon, David L. Harmon, Son V. Nguyen, John F. Rembetski | 1998-02-03 |
| 5622596 | High density selective SiO.sub.2 :Si.sub.3 N.sub.4 etching using a stoichiometrically altered nitride etch stop | David M. Dobuzinsky, Jeffrey P. Gambino, Son V. Nguyen | 1997-04-22 |
| 5618379 | Selective deposition process | Steven A. Grundon, David L. Harmon, Son V. Nguyen, John F. Rembetski | 1997-04-08 |
| 5545581 | Plug strap process utilizing selective nitride and oxide etches | John H. Givens, Charles W. Koburger, III, Jerome B. Lasky | 1996-08-13 |
| 5521422 | Corner protected shallow trench isolation device | Jack A. Mandelman, Brian J. Machesney, Hing Wong, Pai-Hung Pan | 1996-05-28 |
| 5466626 | Micro mask comprising agglomerated material | A. Richard Baker, Jr., Wayne S. Berry, Daniel Carl, Donald McAllpine Kenney, Thomas J. Licata | 1995-11-14 |