Issued Patents All Time
Showing 26–50 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10043668 | Selective dry etch for directed self assembly of block copolymers | Sebastian U. Engelmann, Ashish Jagtiani, Hiroyuki Miyazoe | 2018-08-07 |
| 10037398 | Pattern decomposition method for wiring patterns with chemoepitaxy based directed self assembly | Markus Brink, Joy Cheng, Gregory S. Doerk, Michael A. Guillorn, Kafai Lai | 2018-07-31 |
| 9941121 | Selective dry etch for directed self assembly of block copolymers | Sebastian U. Engelmann, Ashish Jagtiani, Hiroyuki Miyazoe | 2018-04-10 |
| 9933420 | Graphene nanomesh based charge sensor | Ali Afzali-Ardakani, Shu-Jen Han, Amal Kasry, Ahmed Maarouf, Glenn J. Martyna +1 more | 2018-04-03 |
| 9911603 | Pattern decomposition for directed self assembly patterns templated by sidewall image transfer | Joy Cheng, Michael A. Guillorn, Chi-Chun Liu | 2018-03-06 |
| 9884978 | Directed self-assembly | Joy Cheng, Michael A. Guillorn, Chi-Chun Liu, Jed W. Pitera | 2018-02-06 |
| 9881793 | Neutral hard mask and its application to graphoepitaxy-based directed self-assembly (DSA) patterning | Sebastian U. Engelmann, Mahmoud Khojasteh, Deborah A. Neumayer, John M. Papalia | 2018-01-30 |
| 9852260 | Method and recording medium of reducing chemoepitaxy directed self-assembled defects | Michael A. Guillorn, Kafai Lai, Chi-Chun Liu, Ananthan Raghunathan | 2017-12-26 |
| 9766229 | Graphene nanomesh based charge sensor | Ali Afzali-Ardakani, Shu-Jen Han, Amal Kasry, Ahmed Maarouf, Glenn J. Martyna +1 more | 2017-09-19 |
| 9738765 | Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers | Markus Brink, Joy Cheng, Gregory S. Doerk, Alexander Friz, Michael A. Guillorn +4 more | 2017-08-22 |
| 9691615 | Chemoepitaxy-based directed self assembly process with tone inversion for unidirectional wiring | Markus Brink, Joy Cheng, Gregory S. Doerk, Michael A. Guillorn | 2017-06-27 |
| 9659824 | Graphoepitaxy directed self-assembly process for semiconductor fin formation | Joy Cheng, Matthew E. Colburn, Michael A. Guillorn, Chi-Chun Liu, Melia Tjio | 2017-05-23 |
| 9646883 | Chemoepitaxy etch trim using a self aligned hard mask for metal line to via | Markus Brink, Michael A. Guillorn, Chung-Hsun Lin | 2017-05-09 |
| 9581899 | 2-dimensional patterning employing tone inverted graphoepitaxy | Michael A. Guillorn, Kafai Lai, Jed W. Pitera | 2017-02-28 |
| 9582631 | Method and system for template pattern optimization for DSA patterning using graphoepitaxy | Michael A. Guillorn, Kafai Lai, Melih Ozlem | 2017-02-28 |
| 9576817 | Pattern decomposition for directed self assembly patterns templated by sidewall image transfer | Joy Cheng, Michael A. Guillorn, Chi-Chun Liu | 2017-02-21 |
| 9558310 | Method and system for template pattern optimization for DSA patterning using graphoepitaxy | Michael A. Guillorn, Kafai Lai, Melih Ozlem | 2017-01-31 |
| 9514263 | Chemo epitaxy mask generation | Joy Cheng, Gregory S. Doerk, Michael A. Guillorn, Kafai Lai | 2016-12-06 |
| 9389516 | Resist performance for the negative tone develop organic development process | Luisa D. Bozano, Dario L. Goldfarb, Linda Karin Sundberg, Hoa D. Truong, Gregory M. Walraff | 2016-07-12 |
| 9385027 | Sublithographic Kelvin structure patterned with DSA | Josephine B. Chang, Michael A. Guillorn, Chung-Hsun Lin | 2016-07-05 |
| 9385026 | Sublithographic Kelvin structure patterned with DSA | Josephine B. Chang, Michael A. Guillorn, Chung-Hsun Lin | 2016-07-05 |
| 9349640 | Electrode pair fabrication using directed self assembly of diblock copolymers | Josephine B. Chang, Michael A. Guillorn, Hiroyuki Miyazoe, Adam M. Pyzyna | 2016-05-24 |
| 9337033 | Dielectric tone inversion materials | Martin Glodde, Wu-Song Huang, Hiroyuki Miyazoe, Ratnam Sooriyakumaran | 2016-05-10 |
| 9306164 | Electrode pair fabrication using directed self assembly of diblock copolymers | Josephine B. Chang, Michael A. Guillorn, Hiroyuki Miyazoe, Adam M. Pyzyna | 2016-04-05 |
| 9281212 | Dielectric tone inversion materials | Martin Glodde, Wu-Song Huang, Hiroyuki Miyazoe, Ratnam Sooriyakumaran | 2016-03-08 |