AK

Ahmad D. Katnani

IBM: 31 patents #3,235 of 70,183Top 5%
Globalfoundries: 1 patents #2,221 of 4,424Top 55%
SL Shipley Company, L.L.C.: 1 patents #226 of 401Top 60%
📍 Poughkeepsie, NY: #123 of 1,613 inventorsTop 8%
🗺 New York: #3,677 of 115,490 inventorsTop 4%
Overall (All Time): #113,058 of 4,157,543Top 3%
32
Patents All Time

Issued Patents All Time

Showing 26–32 of 32 patents

Patent #TitleCo-InventorsDate
6037097 E-beam application to mask making using new improved KRS resist system James J. Bucchignano, Wu-Song Huang, Kim Y. Lee, Wayne M. Moreau, Karen E. Petrillo 2000-03-14
5955222 Method of making a rim-type phase-shift mask and mask manufactured thereby Michael S. Hibbs, Steven J. Holmes, Wayne M. Moreau, Niranjan M. Patel 1999-09-21
5919597 Methods for preparing photoresist compositions Roger F. Sinta, Uday Kumar, George W. Orsula, James I. T. Fahey, William R. Brunsvold +3 more 1999-07-06
5733705 Acid Scavengers for use in chemically amplified photoresists Nageshwer Rao Bantu, William R. Brunsvold, George J. Hefferon, Wu-Song Huang, Mahmoud M. Khofasteh +2 more 1998-03-31
5667938 Acid scavengers for use in chemically amplified photoresists Nageshwer Rao Bantu, William R. Brunsvold, George J. Hefferon, Wu-Song Huang, Mahmoud Khojasteh +2 more 1997-09-16
5609989 Acid scavengers for use in chemically amplified photoresists Nageshwer Rao Bantu, William R. Brunsvold, George J. Hefferon, Wu-Song Huang, Mahmoud Khojasteh +2 more 1997-03-11
5296332 Crosslinkable aqueous developable photoresist compositions and method for use thereof Harbans S. Sachdev, Willard E. Conley, Premlatha Jagannathan, Ranee W. Kwong, Leo L. Linehan +2 more 1994-03-22