Issued Patents All Time
Showing 26–46 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7425714 | Measurement method of electron beam current, electron beam writing system and electron beam detector | Makoto Sakakibara, Yoshinori Nakayama, Yasunari Sohda, Noriyuki Tanaka, Yasuhiro Someda | 2008-09-16 |
| 7423274 | Electron beam writing system and electron beam writing method | Yoshinori Nakayama, Makoto Sakakibara, Yasunari Sohda, Masaki Hosoda | 2008-09-09 |
| 7378671 | Aberration measuring apparatus for charged particle beam optical system, charged particle beam lithography machine having the aberration measuring apparatus, and device fabrication method using the apparatus | Masato Muraki | 2008-05-27 |
| 7230252 | Aberration adjusting method, device fabrication method, and charged particle beam lithography machine | Masato Muraki | 2007-06-12 |
| 7189979 | Electron gun | Masahiko Okunuki | 2007-03-13 |
| 7126140 | Multi-electron beam exposure method and apparatus | Haruo Yoda, Yasunari Souda, Yoshikiyo Yui, Shinichi Hashimoto | 2006-10-24 |
| 7067830 | Multi-electron beam exposure method and apparatus | Haruo Yoda, Yasunari Souda, Yoshikiyo Yui, Shinichi Hashimoto | 2006-06-27 |
| 7049607 | Electron beam writing equipment and electron beam writing method | Yasunari Sohda, Osamu Kamimura, Susumu Gotoh | 2006-05-23 |
| 7005659 | Charged particle beam exposure apparatus, charged particle beam exposure method, and device manufacturing method using the same apparatus | Masato Muraki, Osamu Kamimura | 2006-02-28 |
| 6992307 | Electron beam source and electron beam exposure apparatus employing the electron beam source | Yoshikiyo Yui | 2006-01-31 |
| 6946665 | Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus | Masato Muraki, Yoshinori Nakayama, Haruo Yoda, Norio Saitou | 2005-09-20 |
| 6870171 | Exposure apparatus | Masaki Hosoda, Masato Muraki, Haruo Yoda | 2005-03-22 |
| 6870310 | Multibeam generating apparatus and electron beam drawing apparatus | Masahiko Okunuki, Norio Saito, Masaki Takakuwa, Sayaka Tanimoto, Takeshi Haraguchi | 2005-03-22 |
| 6838682 | Electron beam exposure equipment and electron beam exposure method | Yasunari Sohda, Osamu Kamimura, Susumu Gotoh | 2005-01-04 |
| 6809319 | Electron beam writing equipment and electron beam writing method | Yasunari Sohda, Osamu Kamimura, Susumu Gotoh | 2004-10-26 |
| 6784442 | Exposure apparatus, control method thereof, and device manufacturing method | Masato Muraki, Shin Hashimoto | 2004-08-31 |
| 6768118 | Electron beam monitoring sensor and electron beam monitoring method | Yoshinori Nakayama, Yasunari Sohda, Norio Saitou, Masato Muraki, Masaki Takakuwa | 2004-07-27 |
| 6667486 | Electron beam exposure method, electron beam exposure apparatus and device manufacturing method using the same | Yasunari Sohda, Norio Saitou, Haruo Yoda, Yoshikiyo Yui, Shin'ichi Hashimoto | 2003-12-23 |
| 6511048 | Electron beam lithography apparatus and pattern forming method | Yasunari Sohda, Yasuhiro Someda, Takashi Matsuzaka, Norio Saitou, Yoshinori Nakayama | 2003-01-28 |
| 6159644 | Method of fabricating semiconductor circuit devices utilizing multiple exposures | Hidetoshi Satoh, Yoshinori Nakayama, Masahide Okumura, Norio Saitou | 2000-12-12 |
| 5326979 | Electron beam lithography system | Katsuhiro Kawasaki, Takashi Matsuzaka, Toshihiko Kohno | 1994-07-05 |