YN

Yoshihiro Nakata

Fujitsu Limited: 51 patents #251 of 24,456Top 2%
SG Sunstar Giken: 8 patents #4 of 106Top 4%
OU Osaka University: 7 patents #69 of 1,984Top 4%
Mitsubishi Electric: 2 patents #11,187 of 25,717Top 45%
SC Shinko Electric Industries Co.: 2 patents #315 of 723Top 45%
FL Fujitsu Semiconductor Limited: 1 patents #612 of 1,301Top 50%
JC Jgc Catalysts And Chemicals: 1 patents #74 of 139Top 55%
KL Kyushu Fujitsu Electronics Limited: 1 patents #41 of 75Top 55%
EB Ebara: 1 patents #1,014 of 1,611Top 65%
DE Denso: 1 patents #6,940 of 11,792Top 60%
TO Toyota: 1 patents #15,335 of 26,838Top 60%
SC Stanley Electric Co.: 1 patents #550 of 1,072Top 55%
SE Sunstar Engineering: 1 patents #37 of 120Top 35%
CC Catalysts & Chemicals Industries Co.: 1 patents #56 of 128Top 45%
TL Tokyo Electron Limited: 1 patents #3,538 of 5,567Top 65%
UB Uni-Sunstar B.V.: 1 patents #10 of 27Top 40%
FL Fujitsu Microelectronics Limited: 1 patents #212 of 624Top 35%
Overall (All Time): #27,385 of 4,157,543Top 1%
72
Patents All Time

Issued Patents All Time

Showing 26–50 of 72 patents

Patent #TitleCo-InventorsDate
8399295 Semiconductor device and its manufacture method Sadahiro Kishii, Tsuyoshi Kanki, Yasushi Kobayashi, Masato Tanaka, Akio Rokugawa 2013-03-19
8390099 Interconnection substrate having first and second insulating films with an adhesion enhancing layer therebetween Shirou Ozaki, Tadahiro Imada, Yasushi Kobayashi 2013-03-05
8382352 Projector-type headlight and configuration structure of resin projector lens thereof Yasushi Yatsuda, Eiji Kawamoto 2013-02-26
8378489 Semiconductor device and manufacturing method therefor Shiro Ozaki, Yasushi Kobayashi, Ei Yano 2013-02-19
8207059 Silicon compound, ultraviolet absorbent, method for manufacturing multilayer wiring device and multilayer wiring device Shirou Ozaki, Ei Yano 2012-06-26
8164166 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device Tadahiro Imada, Kouta Yoshikawa 2012-04-24
8124239 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same Ei Yano 2012-02-28
8089138 Surface-hydrophobicized film, material for formation of surface-hydrophobicized film, wiring layer, semiconductor device and process for producing semiconductor device Tadahiro Imada 2012-01-03
8062414 Coating liquid for forming amorphous silica-based coating film with low dielectric constant Akira Nakashima, Miki Egami, Michio Komatsu, Ei Yano, Katsumi Suzuki 2011-11-22
7985700 Composition for forming insulating film and method for fabricating semiconductor device Shirou Ozaki, Ei Yano 2011-07-26
7928536 Roughness reducing film at interface, materials for forming roughness reducing film at interface, wiring layer and semiconductor device using the same, and method for manufacturing semiconductor device Tadahiro Imada, Ei Yano 2011-04-19
7909701 Power transmission apparatus Keiji Ishikawa, Yasuo Tabuchi, Michiyasu Nosaka, Takayuki Suzuki 2011-03-22
7875981 Insulating film material, multilayer interconnection structure, method for manufacturing same, and method for manufacturing semiconductor device Yasushi Kobayashi, Shirou Ozaki 2011-01-25
7830012 Material for forming exposure light-blocking film, multilayer interconnection structure and manufacturing method thereof, and semiconductor device Shirou Ozaki 2010-11-09
7830013 Material for forming adhesion reinforcing layer, adhesion reinforcing layer, semiconductor device, and manufacturing method thereof Junichi Kon, Ei Yano, Tadahiro Imada 2010-11-09
7732927 Semiconductor device having a interlayer insulation film with low dielectric constant and high mechanical strength Shoichi Suda, Shino Tokuyo, Azuma Matsuura 2010-06-08
7728065 Material for forming exposure light-blocking film, multilayer interconnection structure and manufacturing method thereof, and semiconductor device Shirou Ozaki 2010-06-01
7709394 Substrate processing method and apparatus fabrication process of a semiconductor device Hidenori Miyoshi, Kenji Ishikawa, Yukio Takigawa, Hideki Tateishi 2010-05-04
7659357 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same Ei Yano 2010-02-09
7655576 Insulator film, manufacturing method of multilayer wiring device and multilayer wiring device Shirou Ozaki, Ei Yano 2010-02-02
7541296 Method for forming insulating film, method for forming multilayer structure and method for manufacturing semiconductor device Tamotsu Owada, Hirofumi Watatani, Shirou Ozaki, Shun-ichi Fukuyama 2009-06-02
7476970 Composition for forming insulating film and method for fabricating semiconductor device Shirou Ozaki, Ei Yano 2009-01-13
7470975 Composition for forming insulation film, insulation film for semiconductor device, and fabrication method and semiconductor device thereof Tadahiro Imada, Yasushi Kobayashi 2008-12-30
7358299 Silicon-based composition, low dielectric constant film, semiconductor device, and method for producing low dielectric constant film Ei Yano 2008-04-15
7262142 Semiconductor device fabrication method Shirou Ozaki, Ei Yano 2007-08-28