Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10418500 | Infrared detector, imaging device, and imaging system | Ryo Suzuki, Hironori Nishino | 2019-09-17 |
| 10236319 | Photodetector and imaging device | Ryo Suzuki, Hiroyasu Yamashita, Hironori Nishino | 2019-03-19 |
| 9926422 | Bump-forming material, method for producing electronic component, method for producing semiconductor device, and semiconductor device | — | 2018-03-27 |
| 9496222 | Semiconductor device including insulating films with different moisture resistances and fabrication method thereof | Yoshihiro Nakata, Kozo Makiyama | 2016-11-15 |
| 9354517 | Resist composition and method for forming pattern | Yoshihiro Nakata | 2016-05-31 |
| 8940622 | Method for manufacturing compound semiconductor device and detergent | — | 2015-01-27 |
| 8860211 | Semiconductor device, semiconductor device manufacturing method, and electronic device | — | 2014-10-14 |
| 8815017 | Method of manufacturing semiconductor device and method of cleaning semiconductor substrate | Shirou Ozaki, Masayuki Takeda, Norikazu Nakamura | 2014-08-26 |
| 8795951 | Material for forming resist sensitization film and production method of semiconductor device | — | 2014-08-05 |
| 8759161 | Surface coating method, semiconductor device, and circuit board package | — | 2014-06-24 |
| 8557144 | Material for forming conductive antireflection film, method for forming conductive antireflection film, method for forming resist pattern, semiconductor device, and magnetic head | — | 2013-10-15 |
| 8349542 | Manufacturing process of semiconductor device | Miwa Kozawa, Koji Nozaki, Takahisa Namiki, Ei Yano | 2013-01-08 |
| 8338072 | Resist composition, resist pattern forming process, and method for manufacturing semiconductor device | — | 2012-12-25 |
| 8334091 | Resist pattern swelling material, and method for patterning using same | Koji Nozaki, Miwa Kozawa, Takahisa Namiki, Ei Yano | 2012-12-18 |
| 8313892 | Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device | — | 2012-11-20 |
| 8057986 | Method for forming resist pattern and method for manufacturing a semiconductor device | Ei Yano | 2011-11-15 |
| 7830013 | Material for forming adhesion reinforcing layer, adhesion reinforcing layer, semiconductor device, and manufacturing method thereof | Ei Yano, Yoshihiro Nakata, Tadahiro Imada | 2010-11-09 |
| 7744768 | Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof | Miwa Kozawa, Koji Nozaki, Takahisa Namiki, Ei Yano | 2010-06-29 |
| 7723016 | Method for forming resist pattern and method for manufacturing a semiconductor device | Ei Yano | 2010-05-25 |
| 7465527 | Resist material, resist pattern and forming method for the same, and a semiconductor device and manufacturing method for the same | Ei Yano | 2008-12-16 |
| 7364829 | Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device | Miwa Kozawa, Koji Nozaki, Takahisa Namiki | 2008-04-29 |
| 7338750 | Resist pattern thickness reducing material, resist pattern and process for forming thereof, and semiconductor device and process for manufacturing thereof | Miwa Kozawa, Koji Nozaki, Takahisa Namiki | 2008-03-04 |
| 7220628 | Semiconductor device and manufacturing method thereof, and gate electrode and manufacturing method thereof | Koji Nozaki, Kozo Makiyama, Toshihiro Ohki | 2007-05-22 |
| 7189783 | Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof | Miwa Kozawa, Koji Nozaki, Takahisa Namiki, Ei Yano | 2007-03-13 |
| 6844135 | Chemically amplified resist material and patterning method using same | Koji Nozaki, Ei Yano | 2005-01-18 |