Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9236302 | Semiconductor device and manufacturing method of semiconductor device | Hikaru Ohira, Hirosato Ochimizu | 2016-01-12 |
| 9123728 | Semiconductor device and method for manufacturing semiconductor device | Takahiro Kono, Shinichi Akiyama, Hirofumi Watatani | 2015-09-01 |
| 9087873 | Semiconductor device manufacturing method | — | 2015-07-21 |
| 8916423 | Semiconductor device and method of manufacturing the same | Hikaru Ohira, Hirosato Ochimizu | 2014-12-23 |
| 8883613 | Manufacturing method of semiconductor device, processing method of semiconductor wafer, semiconductor wafer | — | 2014-11-11 |
| 8778814 | Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device | Shun-ichi Furuyama, Hirofumi Watantani, Kengo Inoue, Atsuo Shimizu | 2014-07-15 |
| 8669177 | Semiconductor device and method for manufacturing semiconductor device | Takahiro Kouno, Shinichi Akiyama, Hirofumi Watatani | 2014-03-11 |
| 8604552 | Semiconductor device and method for fabricating semiconductor device | Hirofumi Watatani | 2013-12-10 |
| 8349722 | Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device | Shun-ichi Fukuyama, Hirofumi Watatani, Kengo Inoue, Atsuo Shimizu | 2013-01-08 |
| 8105935 | Method of manufacturing a semiconductor device | Naoki Ohara, Hirofumi Watatani, Kenichi Yanai | 2012-01-31 |
| 8026164 | Semiconductor device and method of manufacturing the same | Satoshi Takesako, Shinichi Akiyama | 2011-09-27 |
| 7928476 | Semiconductor device and method of manufacturing the same | Hiroshi Kudo, Nobuyuki Ohtsuka, Masaki Haneda | 2011-04-19 |
| 7763509 | Method of manufacturing semiconductor device including forming two stress films and irradiation of one stress film | Sergey Pidin | 2010-07-27 |
| 7749897 | Method of manufacturing semiconductor device | Ken Sugimoto, Yoshiyuki Ohkura, Hirofumi Watatani, Shunn-ichi Fukuyama | 2010-07-06 |
| 7642185 | Insulating film forming method capable of enhancing adhesion of silicon carbide film, etc. and semiconductor device | Hirofumi Watatani, Ken Sugimoto, Shun-ichi Fukuyama | 2010-01-05 |
| 7579277 | Semiconductor device and method for fabricating the same | Hisaya Sakai, Shun-ichi Fukuyama | 2009-08-25 |
| 7541296 | Method for forming insulating film, method for forming multilayer structure and method for manufacturing semiconductor device | Hirofumi Watatani, Yoshihiro Nakata, Shirou Ozaki, Shun-ichi Fukuyama | 2009-06-02 |
| 7485570 | Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device | Shun-ichi Fukuyama, Hirofumi Watatani, Kengo Inoue, Atsuo Shimizu | 2009-02-03 |
| 7256118 | Semiconductor device using low-K material as interlayer insulating film and its manufacture method | Shun-ichi Fukuyama, Ken Sugimoto | 2007-08-14 |
| 7235866 | Low dielectric constant film material, film and semiconductor device using such material | Yoshihiro Nakata, Shun-ichi Fukuyama, Katsumi Suzuki, Ei Yano, Iwao Sugiura | 2007-06-26 |
| 7208405 | Insulating film forming method capable of enhancing adhesion of silicon carbide film, etc. and semiconductor device | Hirofumi Watatani, Ken Sugimoto, Shun-ichi Fukuyama | 2007-04-24 |
| 6958525 | Low dielectric constant film material, film and semiconductor device using such material | Yoshihiro Nakata, Shun-ichi Fukuyama, Katsumi Suzuki, Ei Yano, Iwao Sugiura | 2005-10-25 |
| 6949830 | Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device | Shun-ichi Fukuyama, Hirofumi Watatani, Kengo Inoue, Atsuo Shimizu | 2005-09-27 |
| 6943431 | Semiconductor device using low-k material as interlayer insulating film and including a surface modifying layer | Shun-ichi Fukuyama, Hiroko Inoue, Ken Sugimoto | 2005-09-13 |
| 6613834 | Low dielectric constant film material, film and semiconductor device using such material | Yoshihiro Nakata, Shun-ichi Fukuyama, Katsumi Suzuki, Ei Yano, Iwao Sugiura | 2003-09-02 |