ME

Miki Egami

JC Jgc Catalysts And Chemicals: 16 patents #6 of 139Top 5%
CC Catalysts & Chemicals Industries Co.: 5 patents #18 of 128Top 15%
Fujitsu Limited: 3 patents #8,614 of 24,456Top 40%
Overall (All Time): #199,153 of 4,157,543Top 5%
21
Patents All Time

Issued Patents All Time

Showing 1–21 of 21 patents

Patent #TitleCo-InventorsDate
12187618 Silica particle dispersion liquid and production method thereof Mitsuaki Kumazawa, Ryo Muraguchi, Michio Komatsu 2025-01-07
12134563 Porous silica particles and method for producing same Takuji Miyamoto, Ryo Muraguchi 2024-11-05
11613683 Method for producing chain-like particle dispersion, and dispersion of chain-like particles Masanobu Taniguchi, Mitsuaki Kumazawa, Ryo Muraguchi 2023-03-28
11542167 Silica particle dispersion liquid and production method thereof Shogo Hayashi, Mitsuaki Kumazawa, Ryo Muraguchi, Michio Komatsu 2023-01-03
11492513 Dispersion liquid of silica particles, polishing composition, and method for producing dispersion liquid of silica particles Mitsuaki Kumazawa, Ryo Muraguchi, Michio Komatsu 2022-11-08
11427730 Dispersion liquid of silica particles and production method therefor Mitsuaki Kumazawa, Hirotada ARAKANE, Ryo Muraguchi, Toshiharu Hirai 2022-08-30
11312634 Production method for dispersion liquid of silica particle Mitsuaki Kumazawa, Hirotada ARAKANE, Ryo Muraguchi, Toshiharu Hirai 2022-04-26
11254580 Silica particle liquid dispersion and production method therefor Mitsuaki Kumazawa, Hirotada ARAKANE, Ryo Muraguchi, Toshiharu Hirai 2022-02-22
10358353 Method for producing disintegrated silica particles Ryo Muraguchi, Mitsuaki Kumazawa, Masanobu Taniguchi, Tsuguo Koyanagi, Michio Komatsu +1 more 2019-07-23
10301183 Silica particle dispersion and production method of the same Mitsuaki Kumazawa, Hirotada ARAKANE, Ryo Muraguchi, Toshiharu Hirai 2019-05-28
10190023 Silica-based polishing particle and abrasive Mitsuaki Kumazawa, Hirotada ARAKANE, Ryo Muraguchi, Toshiharu Hirai 2019-01-29
10184069 Silica-based polishing particle and abrasive Mitsuaki Kumazawa, Hirotada ARAKANE, Ryo Muraguchi, Toshiharu Hirai 2019-01-22
8686101 Coating liquid for forming low dielectric constant amorphous silica-based coating film and the coating film obtained from the same Hiroki Arao, Akira Nakashima, Michio Komatsu 2014-04-01
8227028 Method for forming amorphous silica-based coating film with low dielectric constant and thus obtained amorphous silica-based coating film Akira Nakashima, Michio Komatsu 2012-07-24
8062414 Coating liquid for forming amorphous silica-based coating film with low dielectric constant Akira Nakashima, Michio Komatsu, Yoshihiro Nakata, Ei Yano, Katsumi Suzuki 2011-11-22
7998567 Coating liquid for formation of protective film for semiconductor processing and method for preparation of the same Hiroki Arao, Akira Nakashima, Michio Komatsu 2011-08-16
7232769 Method of forming amorphous silica-based coating film with low dielectric constant and thus obtained silica-based coating film Akira Nakashima, Michio Komatsu, Yoshihiro Nakata, Ei Yano, Katsumi Suzuki 2007-06-19
6716773 Process for producing semiconductor substrates Ryo Muraguchi 2004-04-06
6599846 Method of forming a silica-containing coating film with a low dielectric constant and semiconductor substrate coated with such a film Michio Komatsu, Akira Nakashima, Ryo Muraguchi 2003-07-29
6451436 Coating liquid for forming a silica-containing film with a low-dielectric constant and substrate coated with such a film Michio Komatsu, Akira Nakashima 2002-09-17
6261357 Coating liquid for forming low-permittivity silica film and substrate having low-permittivity coating film Akira Nakashima, Michio Komatsu 2001-07-17