Issued Patents All Time
Showing 51–73 of 73 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6342562 | Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method | Miwa Kozawa, Keiji Watanabe | 2002-01-29 |
| 6338903 | Resin composition for semiconductor encapsulation, method and apparatus for producing the composition, as well as semiconductor device using the composition | Yukio Takigawa | 2002-01-15 |
| 6329125 | Chemically amplified resist compositions and process for the formation of resist patterns | Satoshi Takechi, Akiko Kotachi, Koji Nozaki, Keiji Watanabe, Takahisa Namiki +3 more | 2001-12-11 |
| 6278192 | Semiconductor device with encapsulating material composed of silica | Yukio Takigawa | 2001-08-21 |
| 6200724 | Chemical amplification resist compositions and process for the formation of resist patterns | Takahisa Namiki, Keiji Watanabe, Koji Nozaki, Miwa Igarashi, Yoko Kuramitsu | 2001-03-13 |
| 6200725 | Chemically amplified resist compositions and process for the formation of resist patterns | Satoshi Takechi, Akiko Kotachi, Koji Nozaki, Keiji Watanabe, Takahisa Namiki +3 more | 2001-03-13 |
| 6140286 | Defluxing agent cleaning method and cleaning apparatus | Keiji Watanabe, Masayuki Ochiai, Yasuo Yamagishi, Nobuo Igusa, Isamu Takachi | 2000-10-31 |
| 6127098 | Method of making resist patterns | Kenji Nakagawa, Akira Oikawa, Masao Kanazawa, Hiroshi Kudo | 2000-10-03 |
| 6052261 | Method for manufacturing magnetoresistance head | Keiji Watanabe, Koji Nozaki, Miwa Igarashi, Yoko Kuramitsu, Takahisa Namiki +4 more | 2000-04-18 |
| 6050479 | Defluxing agent cleaning method and cleaning apparatus | Keiji Watanabe, Masayuki Ochiai, Yasuo Yamagishi, Nobuo Igusa, Isamu Takachi | 2000-04-18 |
| 6027856 | Negative-type resist composition and process for forming resist patterns | Koji Nozaki | 2000-02-22 |
| 6013416 | Chemically amplified resist compositions and process for the formation of resist patterns | Koji Nozaki, Keiji Watanabe, Takahisa Namiki, Miwa Igarashi, Yoko Kuramitsu +3 more | 2000-01-11 |
| 5968713 | Chemically amplified resist compositions and process for the formation of resist patterns | Koji Nozaki, Keiji Watanabe, Takahisa Namiki, Miwa Igarashi, Yoko Kuramitsu +3 more | 1999-10-19 |
| 5962191 | Resist compositions for forming resist patterns | Koji Nozaki, Keiji Watanabe, Takahisa Namiki, Miwa Igarashi, Yoko Kuramitsu | 1999-10-05 |
| 5910392 | Resist composition, a process for forming a resist pattern and a process for manufacturing a semiconductor device | Koji Nozaki, Keiji Watanabe, Takahisa Namiki, Miwa Igarashi | 1999-06-08 |
| 5906912 | Processes for forming resist pattern and for producing semiconductor device | Keiji Watanabe, Miwa Igarashi, Keiko Yano, Takashi Maruyama, Eiichi Hoshino +2 more | 1999-05-25 |
| 5824452 | Resist compositions and process for the formation of resist patterns | Koji Nozaki, Keiji Watanabe, Takahisa Namiki, Miwa Igarashi, Yoko Kuramitsu | 1998-10-20 |
| 5804354 | Composition for forming conductivity imparting agent and pattern forming method | Keiji Watanabe, Yasuhiro Yoneda, Takashi Maruyama, Keiko Yano, Tomio Nakamura +5 more | 1998-09-08 |
| 5776659 | Ionizing radiation exposure method utilizing water soluble aniline antistatic polymer layer | Keiji Watanabe, Takahisa Namiki, Keiko Yano, Takashi Maruyama, Tomio Nakamura +4 more | 1998-07-07 |
| 5695571 | Cleaning method using a defluxing agent | Keiji Watanabe, Masayuki Ochiai, Yasuo Yamagishi, Nobuo Igusa, Isamu Takachi | 1997-12-09 |
| 5633121 | Method for examining surface of copper layer in circuit board and process for producing circuit board | Takahisa Namiki, Yasuo Yamagishi | 1997-05-27 |
| 5482174 | Method for removing copper oxide on the surface of a copper film and a method for patterning a copper film | Takahisa Namiki, Yasuo Yamagishi | 1996-01-09 |
| 5444811 | Organic functional optical thin film, fabrication and use thereof | Tetsuzo Yoshimura, Satoshi Tatsuura, Wataru Sotoyama | 1995-08-22 |