Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6033134 | Resist developing apparatus used in process for production of semiconductor device | Takashi Maruyama, Tatsuo Chijimatsu, Koichi Kobayashi, Hiroyuki Kanata | 2000-03-07 |
| 5906912 | Processes for forming resist pattern and for producing semiconductor device | Keiji Watanabe, Miwa Igarashi, Ei Yano, Takashi Maruyama, Eiichi Hoshino +2 more | 1999-05-25 |
| 5804354 | Composition for forming conductivity imparting agent and pattern forming method | Keiji Watanabe, Yasuhiro Yoneda, Takashi Maruyama, Tomio Nakamura, Shigeru Shimizu +5 more | 1998-09-08 |
| 5783367 | Process for production of semiconductor device and resist developing apparatus used therein | Takashi Maruyama, Tatsuo Chijimatsu, Koichi Kobayashi, Hiroyuki Kanata | 1998-07-21 |
| 5776659 | Ionizing radiation exposure method utilizing water soluble aniline antistatic polymer layer | Keiji Watanabe, Ei Yano, Takahisa Namiki, Takashi Maruyama, Tomio Nakamura +4 more | 1998-07-07 |
| 5721091 | Composition for forming an electrically conductive layer to be used in patterning | Keiji Watanabe, Yasuhiro Yoneda, Takashi Maruyama, Tomio Nakamura, Shigeru Shimizu +1 more | 1998-02-24 |
| 5560870 | Composition for forming an electrically conductive layer to be used in patterning | Keiji Watanabe, Yasuhiro Yoneda, Takashi Maruyama, Tomio Nakamura, Shigeru Shimizu +1 more | 1996-10-01 |
| 5210696 | Electron beam exposure data processing method, electron beam exposure method and apparatus | — | 1993-05-11 |
| 5091285 | Method of forming pattern by using an electroconductive composition | Keiji Watanabe, Yasuhiro Yoneda, Koichi Kobayashi, Tomio Nakamura, Shigeru Shimizu | 1992-02-25 |