Issued Patents All Time
Showing 26–50 of 73 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7144968 | Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method | Miwa Kozawa, Keiji Watanabe | 2006-12-05 |
| 7122288 | Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device | Miwa Kozawa, Koji Nozaki, Keiji Watanabe | 2006-10-17 |
| 7038477 | Contactor having conductive particles in a hole as a contact electrode | Shigeyuki Maruyama, Susumu Kida, Naoyuki Watanabe, Takafumi Hashitani, Ichiro Midorikawa | 2006-05-02 |
| 6958525 | Low dielectric constant film material, film and semiconductor device using such material | Yoshihiro Nakata, Shun-ichi Fukuyama, Katsumi Suzuki, Tamotsu Owada, Iwao Sugiura | 2005-10-25 |
| 6937038 | Contactor having conductive particles in a hole as a contact electrode | Shigeyuki Maruyama, Susumu Kida, Naoyuki Watanabe, Takafumi Hashitani, Ichiro Midorikawa | 2005-08-30 |
| 6887644 | Polymer compound for a chemical amplification resist and a fabrication process of a semiconductor device using such a chemical amplification resist | Koji Nozaki | 2005-05-03 |
| 6844135 | Chemically amplified resist material and patterning method using same | Junichi Kon, Koji Nozaki | 2005-01-18 |
| 6794113 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | Koji Nozaki, Takahisa Namiki, Junichi Kon, Miwa Kozawa | 2004-09-21 |
| 6794112 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | Koji Nozaki, Takahisa Namiki, Junichi Kon, Miwa Kozawa | 2004-09-21 |
| 6791345 | Contactor for testing semiconductor device and manufacturing method thereof | Shigeyuki Maruyama, Kazuhiro Tashiro, Naoyuki Watanabe, Daisuke Koizumi, Takafumi Hashitani | 2004-09-14 |
| 6787288 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | Koji Nozaki, Takahisa Namiki, Junichi Kon, Miwa Kozawa | 2004-09-07 |
| 6780498 | Silicon-based composition, low dielectric constant film, semiconductor device, and method for producing low dielectric constant film | Yoshihiro Nakata, Katsumi Suzuki, Iwao Sugiura | 2004-08-24 |
| 6773867 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | Koji Nozaki, Takahisa Namiki, Junichi Kon, Miwa Kozawa | 2004-08-10 |
| 6770417 | Negative resist composition, process for forming resist patterns, and process for manufacturing electron device | Koji Nozaki, Miwa Kozawa | 2004-08-03 |
| 6727515 | Insulation film forming material, insulation film, method for forming the insulation film, and semiconductor device | Yoshihiro Nakata, Katsumi Suzuki, Iwao Sugiura | 2004-04-27 |
| 6656659 | Resist composition suitable for short wavelength exposure and resist pattern forming method | Koji Nozaki | 2003-12-02 |
| 6613834 | Low dielectric constant film material, film and semiconductor device using such material | Yoshihiro Nakata, Shun-ichi Fukuyama, Katsumi Suzuki, Tamotsu Owada, Iwao Sugiura | 2003-09-02 |
| 6605414 | Method for manufacturing magnetoresistance head | Keiji Watanabe, Koji Nozaki, Miwa Igarashi, Yoko Kuramitsu, Takahisa Namiki +4 more | 2003-08-12 |
| 6582878 | Chemical amplification resist compositions and process for the formation of resist patterns | Takahisa Namiki, Keiji Watanabe, Koji Nozaki, Miwa Igarashi, Yoko Kuramitsu | 2003-06-24 |
| 6565419 | Method of removing particles from stage and cleaning plate | Naoki Nishio, Kazushi Ishida, Yukio Takigawa | 2003-05-20 |
| 6545363 | Contactor having conductive particles in a hole as a contact electrode | Shigeyuki Maruyama, Susumu Kida, Naoyuki Watanabe, Takafumi Hashitani, Ichiro Midorikawa | 2003-04-08 |
| 6541077 | Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method | Miwa Kozawa, Keiji Watanabe | 2003-04-01 |
| 6506534 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | Koji Nozaki, Takahisa Namiki, Junichi Kon, Miwa Kozawa | 2003-01-14 |
| 6465137 | Resist composition and pattern forming process | Keiji Watanabe, Miwa Kozawa, Takahisa Namiki, Koji Nozaki, Junichi Kon +4 more | 2002-10-15 |
| 6451501 | Acid sensitive copolymer, resist composition and resist pattern forming method | Koji Nozaki | 2002-09-17 |