Issued Patents All Time
Showing 1–25 of 55 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9052179 | Optical coherence tomography apparatus and method | Yukihiro Inoue, Eiichi Fujii | 2015-06-09 |
| 7508493 | Exposure apparatus and device manufacturing method | Seiji Takeuchi, Kenji Yamazoe, Yumiko Ohsaki | 2009-03-24 |
| 7327467 | Phase measuring method and apparatus for measuring characterization of optical thin films | Seiji Takeuchi, Akiyoshi Suzuki | 2008-02-05 |
| 7030998 | Phase measurement apparatus for measuring characterization of optical thin films | Seiji Takeuchi, Akiyoshi Suzuki | 2006-04-18 |
| 6972847 | Position detecting system and exposure apparatus using the same | Hideki Ina, Masanobu Hasegawa, Takashi Satoh | 2005-12-06 |
| 6906805 | Position detecting system and exposure apparatus using the same | Hideki Ina, Masanobu Hasegawa, Takashi Satoh | 2005-06-14 |
| 6714302 | Aligning method, aligner, and device manufacturing method | Akiyoshi Suzuki | 2004-03-30 |
| 6636311 | Alignment method and exposure apparatus using the same | Hideki Ina, Masanobu Hasegawa, Takashi Satoh | 2003-10-21 |
| 6594012 | Exposure apparatus | Seiji Takeuchi, Hiroshi Maehara | 2003-07-15 |
| 6124601 | Position sensor having a reflective projecting system and device fabrication method using the sensor | Masanobu Hasegawa, Kyoichi Miyazaki | 2000-09-26 |
| 6040909 | Surface position detecting system and device manufacturing method using the same | Masanobu Hasegawa, Yoshinori Ohsaki | 2000-03-21 |
| 5969820 | Surface position detecting system and exposure apparatus using the same | Masanobu Hasegawa, Kyoichi Miyazaki | 1999-10-19 |
| 5861952 | Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position | Toshihiko Tsuji, Kyoichi Miyazaki, Seiji Takeuchi, Noriyuki Nose | 1999-01-19 |
| 5834767 | Surface position detecting system and projection exposure apparatus using the same | Masanobu Hasegawa, Kyoichi Miyazaki | 1998-11-10 |
| 5777744 | Exposure state detecting system and exposure apparatus using the same | Masanobu Hasegawa, Kyoichi Miyazaki, Seiji Takeuchi | 1998-07-07 |
| 5767962 | Inspection system and device manufacturing method using the same | Masayuki Suzuki, Noriyuki Nose, Kyoichi Miyazaki, Toshihiko Tsuji, Seiji Takeuchi | 1998-06-16 |
| 5751426 | Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object | Noriyuki Nose, Kenji Saitoh, Hiroshi Osawa, Koichi Sentoku, Toshihiko Tsuji +1 more | 1998-05-12 |
| 5750294 | Best focus determining method | Masanobu Hasegawa, Seiji Takeuchi | 1998-05-12 |
| 5742386 | Apparatus for detecting foreign matter on a substrate, and an exposure apparatus including the same | Noriyuki Nose, Kyoichi Miyazaki, Toshihiko Tsuji, Seiji Takeuchi | 1998-04-21 |
| 5729290 | Movement detection device and focus detection apparatus using such device | Jun Tokumitsu, Masayoshi Sekine, Toshiaki Kondo, Koji Takahashi, Isao Harigaya +1 more | 1998-03-17 |
| 5721721 | Two scanning probes information recording/reproducing system with one probe to detect atomic reference location on a recording medium | Yoshihiro Yanagisawa, Yuko Morikawa, Hiroshi Matsuda, Haruki Kawada, Kunihiro Sakai +7 more | 1998-02-24 |
| 5652657 | Inspection system for original with pellicle | Michio Kohno, Seiya Miura, Kyoichi Miyazaki, Toshihiko Tsuji, Seiji Takeuchi | 1997-07-29 |
| 5610715 | Displacement detecting system, an expose apparatus, and a device manufacturing method employing a scale whose displacement is detected by a selected detection head | Kyoichi Miyazaki, Seiji Takeuchi | 1997-03-11 |
| 5610718 | Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes | Koichi Sentoku, Takahiro Matsumoto, Noriyuki Nose, Kenji Saitoh | 1997-03-11 |
| 5541729 | Measuring apparatus utilizing diffraction of reflected and transmitted light | Seiji Takeuchi, Hiroyasu Nose | 1996-07-30 |