Issued Patents All Time
Showing 1–25 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6018395 | Alignment system | Makiko Mori, Shunichi Uzawa, Kunitaka Ozawa, Hirohisa Ohta | 2000-01-25 |
| 5861952 | Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position | Toshihiko Tsuji, Kyoichi Miyazaki, Seiji Takeuchi, Minoru Yoshii | 1999-01-19 |
| 5767962 | Inspection system and device manufacturing method using the same | Masayuki Suzuki, Minoru Yoshii, Kyoichi Miyazaki, Toshihiko Tsuji, Seiji Takeuchi | 1998-06-16 |
| 5751426 | Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object | Minoru Yoshii, Kenji Saitoh, Hiroshi Osawa, Koichi Sentoku, Toshihiko Tsuji +1 more | 1998-05-12 |
| 5742386 | Apparatus for detecting foreign matter on a substrate, and an exposure apparatus including the same | Minoru Yoshii, Kyoichi Miyazaki, Toshihiko Tsuji, Seiji Takeuchi | 1998-04-21 |
| 5610718 | Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes | Koichi Sentoku, Takahiro Matsumoto, Minoru Yoshii, Kenji Saitoh | 1997-03-11 |
| 5593800 | Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus | Hidehiko Fujioka, Ryuichi Ebinuma, Shinichi Hara, Hiroshi Maehara | 1997-01-14 |
| 5585923 | Method and apparatus for measuring positional deviation while correcting an error on the basis of the error detection by an error detecting means | Takeshi Miyachi, Kenji Saitoh, Koichi Sentoku, Takahiro Matsumoto | 1996-12-17 |
| 5557411 | Position detection method | Sakae Houryu | 1996-09-17 |
| 5495336 | Position detecting method for detecting a positional relationship between a first object and a second object | Kunitaka Ozawa, Masanobu Hasegawa | 1996-02-27 |
| 5486919 | Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern | Toshihiko Tsuji, Seiji Takeuchi, Kyoichi Miyazaki, Minoru Yoshii, Tetsuzo Mori | 1996-01-23 |
| 5465148 | Apparatus and method for detecting the relative positional deviation between two diffraction gratings | Takahiro Matsumoto, Kenji Saito, Koichi Sentoku | 1995-11-07 |
| 5461474 | Inspection apparatus for detecting foreign matter on a surface to be inspected, and an exposure apparatus and a device manufacturing method using the same | Minoru Yoshii, Masayuki Suzuki, Kyoichi Miyazaki, Toshihiko Tsuji, Seiji Takeuchi | 1995-10-24 |
| 5459573 | Light quantity controlling apparatus | Naoto Abe, Koji Uda, Isamu Shimoda, Shunichi Uzawa | 1995-10-17 |
| 5440394 | Length-measuring device and exposure apparatus | Kenji Saito, Mitsuaki Amemiya | 1995-08-08 |
| 5432603 | Optical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detected | Koichi Sentoku, Minoru Yoshii, Kenji Saito, Toshihiko Tsuji, Takahiro Matsumoto | 1995-07-11 |
| 5379108 | Alignment system | Naoto Abe | 1995-01-03 |
| 5369486 | Position detector for detecting the position of an object using a diffraction grating positioned at an angle | Takahiro Matsumoto, Minoru Yoshii, Kenji Saitoh, Masanobu Hasegawa, Koichi Sentoku | 1994-11-29 |
| 5343291 | Method and apparatus for measuring an interval between two objects | Mitsutoshi Ohwada, Masakazu Matsugu, Shigeyuki Suda, Minoru Yoshii, Yukichi Niwa +2 more | 1994-08-30 |
| 5333050 | Measuring method and apparatus for meausring the positional relationship of first and second gratings | Kenji Saitoh, Koichi Sentoku, Minoru Yoshii | 1994-07-26 |
| 5327221 | Device for detecting positional relationship between two objects | Kenji Saitoh, Masakazu Matsugu, Shigeyuki Suda, Yukichi Niwa, Ryo Kuroda +3 more | 1994-07-05 |
| 5319444 | Position detecting method and apparatus | Kenji Saitoh, Masakazu Matsugu, Yukichi Niwa, Minoru Yoshii, Shigeyuki Suda | 1994-06-07 |
| 5313272 | Method and apparatus for measuring deviation between patterns on a semiconductor wafer | Kenji Saitoh, Hiroshi Osawa, Masanobu Hasegawa | 1994-05-17 |
| 5294980 | Positioning detecting method and apparatus | Masakazu Matsugu, Kenji Saitoh, Yukichi Niwa, Ryo Kuroda, Shigeyuki Suda | 1994-03-15 |
| 5262257 | Mask for lithography | Yasuaki Fukuda | 1993-11-16 |