Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7657219 | Image forming apparatus | Tadasu Taniguchi, Norichika Katsura, Masahiko Fujita | 2010-02-02 |
| 6819396 | Exposure apparatus, and device manufacturing method | Masayuki Tanabe, Masami Tsukamoto | 2004-11-16 |
| 6167111 | Exposure apparatus for synchrotron radiation lithography | Yutaka Watanabe, Shunichi Uzawa, Nobutoshi Mizusawa, Shinichi Hara | 2000-12-26 |
| 5808312 | System and process for inspecting and repairing an original | — | 1998-09-15 |
| 5751780 | X-ray mask structure, preparation thereof and X-ray exposure method | Shigeyuki Matsumoto | 1998-05-12 |
| 5656398 | Method of making X-ray mask structure | Takeshi Miyachi, Keiko Chiba | 1997-08-12 |
| 5607733 | Process for preparing an X-ray mask structure | Shigeyuki Matsumoto | 1997-03-04 |
| 5606586 | X-ray exposure method and apparatus and device manufacturing method | Mitsuaki Amemiya, Yutaka Watanabe, Akira Miyake | 1997-02-25 |
| 5528654 | Multilayer film for X-rays | Masahito Niibe | 1996-06-18 |
| 5469489 | Production method of an x-ray mask structure, an x-ray mask structure produced thereby, and a device fabricated by using the x-ray mask structure | Akira Miyake, Hiroshi Maehara | 1995-11-21 |
| 5433988 | Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray | Yutaka Watanabe, Shigetaro Ogura, Takashi Iizuka | 1995-07-18 |
| 5390228 | Method of and apparatus for stabilizing shapes of objects, such as optical elements, as well as exposure apparatus using same and method of manufacturing semiconductor devices | Masahito Niibe, Masami Hayashida | 1995-02-14 |
| 5356686 | X-ray mask structure | Hidehiko Fujioka, Takeshi Miyachi, Yuji Chiba, Nobutoshi Mizusawa, Takao Kariya +1 more | 1994-10-18 |
| 5335259 | X-ray exposure apparatus | Masami Hayashida, Yutaka Watanabe | 1994-08-02 |
| 5333167 | Mask structure for x-ray exposure and x-ray exposure device and method using it | Takashi Iizuka | 1994-07-26 |
| 5310603 | Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray | Yutaka Watanabe, Shigetaro Ogura, Takashi Iizuka | 1994-05-10 |
| 5262257 | Mask for lithography | Noriyuki Nose | 1993-11-16 |
| 5204887 | X-ray microscope | Masami Hayashida, Yutaka Watanabe, Masahito Niibe, Takashi Iizuka | 1993-04-20 |
| 5182763 | Reflection device | Takashi Iizuka, Yutaka Watanabe | 1993-01-26 |
| 5159621 | X-ray transmitting window and method of mounting the same | Yutaka Watanabe, Shunichi Uzawa, Nobutoshi Mizusawa, Ryuichi Ebinuma, Mitsuaki Amemiya | 1992-10-27 |
| 5153898 | X-ray reduction projection exposure system of reflection type | Masayuki Suzuki, Noritaka Mochizuki, Setsuo Minami, Shigetaro Ogura, Yutaka Watanabe +2 more | 1992-10-06 |
| 5145649 | Apparatus for cleaning an optical element for use with a radiation beam | Takashi Iizuka, Masami Hayashida, Masahito Niibe | 1992-09-08 |
| 5123036 | X-Ray exposure apparatus | Shinichiro Uno, Yutaka Watanabe, Noritaka Mochizuki, Ryuichi Ebinuma | 1992-06-16 |
| 5101420 | X-ray mask support and process for preparation thereof | Nobuo Kushibiki, Hideo Kato, Akira Miyake | 1992-03-31 |
| 5052033 | Reflection type mask | Tsutomu Ikeda, Yutaka Watanabe, Masayuki Suzuki, Masami Hayashida, Shigetaro Ogura +2 more | 1991-09-24 |