HM

Hiroshi Maehara

Canon: 40 patents #1,092 of 19,416Top 6%
CH Chisso: 2 patents #331 of 833Top 40%
HC Hitachi Consumer Electronics Co.: 1 patents #206 of 447Top 50%
HM Hitachi Maxell: 1 patents #659 of 1,211Top 55%
Overall (All Time): #68,283 of 4,157,543Top 2%
44
Patents All Time

Issued Patents All Time

Showing 25 most recent of 44 patents

Patent #TitleCo-InventorsDate
9348202 Lamp unit and projector employing same Hiroyuki Inoue, Hideharu Saito, Takashi Omori 2016-05-24
8807761 Lamp unit and projector employing same Hiroyuki Inoue, Hideharu Saito, Takashi Omori 2014-08-19
7608593 Resin composition with biodegradable non-liquid-crystalline and liquid-crystalline polymers 2009-10-27
7295357 Apparatus for handling minute object 2007-11-13
7291679 Recyclable polymer and process for production thereof Chieko Mihara, Yoshihiko Kikuchi 2007-11-06
7122297 Photosensitive resin composition, resist composition, fabrication method for patterned substrate, and device 2006-10-17
7072438 Reflection type mask Keiko Chiba, Masami Tsukamoto, Yutaka Watanabe, Shinichi Hara 2006-07-04
7064113 Resin composition, method of molding the same, and method of recycling resin composition 2006-06-20
7019043 Decomposable resin composition and method for producing the same 2006-03-28
7009007 Recyclable polymer, process for production thereof, and recycling treatment thereof Chieko Mihara, Yoshihiko Kikuchi 2006-03-07
6872952 Electron optical system array, method of manufacturing the same, charged-particle beam exposure apparatus, and device manufacturing method Yasuhiro Shimada, Takayuki Yagi, Haruhito Ono 2005-03-29
6866973 Photosensitive resin composition, resist composition, fabricating method for patterned substrate, and device 2005-03-15
6829091 Optical system and optical instrument with diffractive optical element Takashi Kato, Kenji Saitoh, Makoto Ogusu, Keiko Chiba 2004-12-07
6795166 Illuminator, exposure apparatus, and method for fabricating device using the same Hideo Kato 2004-09-21
6728332 X-ray mask, and exposure method and apparatus using the same Keiko Chiba, Masami Tsukamoto, Yutaka Watanabe, Shinichi Hara 2004-04-27
6652781 Method for manufacture of optical element Hideo Kato, Makoto Ogusu 2003-11-25
6653364 Decomposable resin composition and method for producing the same 2003-11-25
6603128 Charged-particle beam exposure apparatus and device manufacturing method Haruhito Ono, Yasuhiro Shimada, Takayuki Yagi 2003-08-05
6594012 Exposure apparatus Seiji Takeuchi, Minoru Yoshii 2003-07-15
6479212 Photosensitive resin, resist composition using the photosensitive resin, pattern formation method using the resist composition, device produced by the pattern formation method, and exposure method Minoru Matsuda, Keita Sakai 2002-11-12
6476968 Optical element Hideo Kato 2002-11-05
6421188 Optical element 2002-07-16
6337161 Mask structure exposure method Keiko Chiba, Hideo Kato 2002-01-08
6317479 X-ray mask, and exposure method and apparatus using the same Keiko Chiba, Masami Tsukamoto, Yutaka Watanabe, Shinichi Hara 2001-11-13
6317274 Optical element Hideo Kato 2001-11-13