Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11752686 | Imprint apparatus and method of controlling imprint apparatus | Hisashi Namba, Noriyasu Hasegawa, Yoshimasa Araki | 2023-09-12 |
| 11267252 | Ejection apparatus and imprint apparatus | Masahiro Kuri, Noriyasu Hasegawa, Hisashi Namba, Ken Katsuta, Nobuto Kawahara +1 more | 2022-03-08 |
| 9947146 | Information processing system for electric two-wheeled vehicle, electric two-wheeled vehicle, electric equipment unit, and key for electric two-wheeled vehicle | Tomoko Maeda, Kaoru Kudou, Masayuki Fujioka, Takashi Ishimura, Susumu Fukushima +2 more | 2018-04-17 |
| 9829789 | Method for determining pattern of mold for imprint, imprint method, and apparatus | Masayuki Tanabe, Setsuo Yoshida, Hitoshi Nakano | 2017-11-28 |
| 9164395 | Exposure apparatus, and method of manufacturing a device | Tatsuya Hayashi, Noriyasu Hasegawa | 2015-10-20 |
| 7754011 | Method of manufacturing a calcium fluoride single crystal | — | 2010-07-13 |
| 7714980 | Exposure apparatus, exposure method, and exposure system | — | 2010-05-11 |
| 7705966 | Immersion exposure apparatus | Noriyasu Hasegawa | 2010-04-27 |
| 7394522 | Exposure apparatus and device manufacturing method | Noriyasu Hasegawa, Tomofumi Nishikawara | 2008-07-01 |
| 7105049 | Method of manufacturing single crystal calcium fluoride | — | 2006-09-12 |
| 6529226 | Thermal printer and driving device for the same | Koji Toyota, Shozou Shiraga, Satoshi Yamaura, Yuji Doi | 2003-03-04 |
| 6479212 | Photosensitive resin, resist composition using the photosensitive resin, pattern formation method using the resist composition, device produced by the pattern formation method, and exposure method | Minoru Matsuda, Hiroshi Maehara | 2002-11-12 |
| 6331383 | Patterning method, and method for manufacturing semiconductor device | — | 2001-12-18 |
| 6288737 | Thermal printer and drive thereof | Koji Toyota, Shozou Shiraga, Satoshi Yamaura, Yuji Doi | 2001-09-11 |
| 6270270 | Printing apparatus | Kazumine Koshi, Noriyuki Saito, Tohru Arakawa, Masaru Shimizu, Masaaki Matsui +1 more | 2001-08-07 |
| 6225019 | Photosensitive resin, resist based on the photosensitive resin, exposure apparatus and exposure method using the resist, and semiconductor device obtained by the exposure method | Minoru Matsuda, Hiroshi Maehara | 2001-05-01 |
| 6087076 | Method of manufacturing semiconductor devices by performing coating, heating, exposing and developing in a low-oxygen or oxygen free controlled environment | Keiko Chiba, Hiroshi Maehara | 2000-07-11 |
| 6008942 | Diffractive optical element and optical instrument having the same | Makoto Ogusu, Hiroshi Maehara | 1999-12-28 |
| 5952149 | Resist solution for photolithography including a base resin and an oxygen-free or low-oxygen solvent | Keiko Chiba, Hiroshi Maehara | 1999-09-14 |
| 5588092 | Printer control circuit and the printer controlled thereby | Hirofumi Komiya, Kazumine Koshi, Noriyuki Saito | 1996-12-24 |
| 5093673 | Thermal line printer with external memory means | Kazumine Koshi | 1992-03-03 |