Issued Patents All Time
Showing 51–75 of 115 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5686984 | Projection exposure method and apparatus to determine optical performance of reticle | — | 1997-11-11 |
| 5673102 | Image farming and microdevice manufacturing method and exposure apparatus in which a light source includes four quadrants of predetermined intensity | Miyoko Noguchi | 1997-09-30 |
| 5631773 | Image projection method and semiconductor device manufacturing method using the same | — | 1997-05-20 |
| 5608575 | Image projection method and semiconductor device manufacturing method using the same | — | 1997-03-04 |
| 5574492 | Imaging method and semiconductor device manufacturing method using the same | — | 1996-11-12 |
| 5489966 | Projection exposure apparatus | Haruna Kawashima, Masato Muraki | 1996-02-06 |
| 5463497 | Illumination device including an optical integrator defining a plurality of secondary light sources and related method | Masato Muraki, Shunzo Imai | 1995-10-31 |
| 5361122 | Autofocusing device and projection exposure apparatus with the same | Yoshiharu Kataoka, Yuichi Yamada | 1994-11-01 |
| 5359407 | Optical scanning apparatus, surface-state inspection apparatus and exposure apparatus | Michio Kohno | 1994-10-25 |
| 5331371 | Alignment and exposure method | Tetsuya Mori | 1994-07-19 |
| 5309197 | Projection exposure apparatus | Tetsuya Mori, Hideki Ina | 1994-05-03 |
| 5305054 | Imaging method for manufacture of microdevices | Miyoko Noguchi | 1994-04-19 |
| 5268744 | Method of positioning a wafer with respect to a focal plane of an optical system | Tetsuya Mori | 1993-12-07 |
| 5262822 | Exposure method and apparatus | Masao Kosugi | 1993-11-16 |
| 5171965 | Exposure method and apparatus | Hiroshi Echizen | 1992-12-15 |
| 5166754 | Alignment system | Tetsuya Mori | 1992-11-24 |
| 5160962 | Projection exposure apparatus | Seiya Miura | 1992-11-03 |
| 5160957 | Alignment and exposure apparatus | Hideki Ina, Masao Kosugi | 1992-11-03 |
| 5153773 | Illumination device including amplitude-division and beam movements | Masato Muraki, Shunzo Imai | 1992-10-06 |
| 5148214 | Alignment and exposure apparatus | Masakatsu Ohta, Hideki Ina | 1992-09-15 |
| 5140366 | Exposure apparatus with a function for controlling alignment by use of latent images | Takahisa Shiozawa, Tsuneo Kanda | 1992-08-18 |
| 5137363 | Projection exposure apparatus | Masao Kosugi, Hideki Ina, Hitoshi Fukuda | 1992-08-11 |
| 5133603 | Device for observing alignment marks on a mask and wafer | Hideki Ina | 1992-07-28 |
| 5124562 | Surface position detecting method at a predetermined and plurality of adjacent points | Haruna Kawashima | 1992-06-23 |
| 5118957 | Method and apparatus for precisely detecting surface position of a patterned wafer | Haruna Kawashima | 1992-06-02 |