| 12419319 |
Method for producing high-protein milk raw material |
Yuki Kawamura, Mizue Saito |
2025-09-23 |
|
| 9312289 |
Photoelectric conversion apparatus, manufacturing method thereof, and image pickup system |
Mineo Shimotsusa |
2016-04-12 |
$31,000 |
| 7641382 |
Leak judgment method, and computer-readable recording medium with recorded leak-judgment-executable program |
Hiroshi Izawa, Hirokazu Ohtoshi, Masatoshi Tanaka |
2010-01-05 |
$223,000 |
| 7288140 |
Wet process gas treatment apparatus |
Hiroshi Izawa |
2007-10-30 |
$458,000 |
| 6930025 |
Transparent conductive film formation process, photovoltaic device production process, transparent conductive film, and photovoltaic device |
Akiya Nakayama, Yasuyoshi Takai, Naoto Okada, Shigeo Kiso |
2005-08-16 |
$195,000 |
| 6860974 |
Long-Term sputtering method |
Yasuyoshi Takai, Akiya Nakayama |
2005-03-01 |
$208,000 |
| 6821317 |
Wet-process gas treatment method and wet-process gas treatment apparatus |
Hiroshi Izawa |
2004-11-23 |
$191,000 |
| 6783640 |
Sputtering method and sputtering apparatus |
Toshihiro Yamashita, Yasuyoshi Takai, Hidetoshi Tsuzuki |
2004-08-31 |
$184,000 |
| 6740210 |
Sputtering method for forming film and apparatus therefor |
Toshihiro Yamashita |
2004-05-25 |
$266,000 |
| 6350489 |
Deposited-film forming process and deposited-film forming apparatus |
Koichiro Moriyama, Masahiro Kanai, Hirokazu Ohtoshi, Takehito Yoshino, Atsushi Yasuno +2 more |
2002-02-26 |
$230,000 |
| 6338872 |
Film forming method |
Takehito Yoshino, Masahiro Kanai, Hirokazu Otoshi, Atsushi Yasuno, Kohei Yoshida +2 more |
2002-01-15 |
$306,000 |
| 6273955 |
Film forming apparatus |
Takehito Yoshino, Masahiro Kanai, Hirokazu Otoshi, Atsushi Yasuno, Kohei Yoshida +2 more |
2001-08-14 |
$217,000 |
| 6253703 |
Microwave chemical vapor deposition apparatus |
Satoshi Takaki |
2001-07-03 |
$277,000 |
| 6113732 |
Deposited film forming apparatus |
Kohei Yoshida, Masahiro Kanai, Hirokazu Ohtoshi, Takehito Yoshino, Masatoshi Tanaka |
2000-09-05 |
$197,000 |
| 5714010 |
Process for continuously forming a large area functional deposited film by a microwave PCVD method and an apparatus suitable for practicing the same |
Jinsho Matsuyama, Toshimitsu Kariya, Yasushi Fujioka, Tetsuya Takei, Katsumi Nakagawa +1 more |
1998-02-03 |
$65,000 |
| 5700326 |
Microwave plasma processing apparatus |
Kazumasa Takatsu, Takashi Kurokawa, Akio Koganei, Shuichiro Sugiyama, Toshio Adachi |
1997-12-23 |
$65,000 |
| 5527391 |
Method and apparatus for continuously forming functional deposited films with a large area by a microwave plasma CVD method |
Yasushi Fujioka, Katsumi Nakagawa, Masahiro Kanai, Toshimitsu Kariya, Jinsho Matsuyama +1 more |
1996-06-18 |
$48,000 |
| 5520740 |
Process for continuously forming a large area functional deposited film by microwave PCVD method and apparatus suitable for practicing the same |
Masahiro Kanai, Jinsho Matsuyama, Katsumi Nakagawa, Toshimitsu Kariya, Yasushi Fujioka +1 more |
1996-05-28 |
$56,000 |
| 5510151 |
Continuous film-forming process using microwave energy in a moving substrate web functioning as a substrate and plasma generating space |
Jinsho Matsuyama, Toshimitsu Kariya, Yasushi Fujioka, Tetsuya Takei, Katsumi Nakagawa +1 more |
1996-04-23 |
$64,000 |
| 5171965 |
Exposure method and apparatus |
Akiyoshi Suzuki |
1992-12-15 |
$7,000 |
| 5130170 |
Microwave PCVD method for continuously forming a large area functional deposited film using a curved moving substrate web with microwave energy with a directivity in one direction perpendicular to the direction of microwave propagation |
Masahiro Kanai, Jinsho Matsuyama, Katsumi Nakagawa, Toshimitsu Kariya, Yasushi Fujioka +1 more |
1992-07-14 |
$8,000 |
| 5114770 |
Method for continuously forming functional deposited films with a large area by a microwave plasma CVD method |
Yasushi Fujioka, Katsumi Nakagawa, Masahiro Kanai, Toshimitsu Kariya, Jinsho Matsuyama +1 more |
1992-05-19 |
$12,000 |
| 5069928 |
Microwave chemical vapor deposition apparatus and feedback control method |
Satoshi Takaki |
1991-12-03 |
$21,000 |
| 5010276 |
Microwave plasma CVD apparatus with plasma generating chamber constituting a cylindrical cavity resonator |
Satoshi Takaki |
1991-04-23 |
$20,000 |
| 4806773 |
Wafer position detecting method and apparatus |
Ryozo Hiraga |
1989-02-21 |
$21,000 |
