| 11114270 |
Scanning magnet design with enhanced efficiency |
Bo H. Vanderberg |
2021-09-07 |
$9,493,000 |
| 11037754 |
Scan and corrector magnet designs for high throughput scanned beam ion implanter |
Bo H. Vanderberg |
2021-06-15 |
$16,188,000 |
| 10573485 |
Tetrode extraction apparatus for ion source |
Wilhelm Platow, Bo H. Vanderberg, Neil J. Bassom, Michael Cristoforo, Joshua Abeshaus |
2020-02-25 |
$3,423,000 |
| 10553392 |
Scan and corrector magnet designs for high throughput scanned beam ion implanter |
Bo H. Vanderberg |
2020-02-04 |
$7,595,000 |
| 10483086 |
Beam profiling speed enhancement for scanned beam implanters |
Andy Ray, Bo H. Vanderberg |
2019-11-19 |
$5,522,000 |
| 10037877 |
Ion implantation system having beam angle control in drift and deceleration modes |
Bo H. Vanderberg |
2018-07-31 |
$7,525,000 |
| 9679739 |
Combined electrostatic lens system for ion implantation |
Bo H. Vanderberg |
2017-06-13 |
$6,186,000 |
| 9620327 |
Combined multipole magnet and dipole scanning magnet |
— |
2017-04-11 |
$5,007,000 |
| 8963107 |
Beam line design to reduce energy contamination |
Bo H. Vanderberg |
2015-02-24 |
$2,916,000 |
| 8803110 |
Methods for beam current modulation by ion source parameter modulation |
Michael Graf, William F. DiVergilio, Daniel R. Tieger |
2014-08-12 |
$1,895,000 |
| 8653486 |
Method and apparatus for improved uniformity control with dynamic beam shaping |
— |
2014-02-18 |
$2,651,000 |
| 8637838 |
System and method for ion implantation with improved productivity and uniformity |
Bo H. Vanderberg |
2014-01-28 |
$2,724,000 |
| 8421039 |
Method and apparatus for improved uniformity control with dynamic beam shaping |
— |
2013-04-16 |
$745,000 |
| 8378313 |
Uniformity of a scanned ion beam |
Andy Ray, Bo H. Vanderberg |
2013-02-19 |
$1,498,000 |
| 8168941 |
Ion beam angle calibration and emittance measurement system for ribbon beams |
Marvin Farley, Donald N. Polner, Geoffrey Ryding, Theodore H. Smick, Takao Sakase +5 more |
2012-05-01 |
$1,782,000 |
| 8089052 |
Ion source with adjustable aperture |
Daniel R. Tieger, William F. DiVergilio, Michael Graf |
2012-01-03 |
$2,489,000 |
| 8008636 |
Ion implantation with diminished scanning field effects |
— |
2011-08-30 |
$2,427,000 |
| 7858955 |
System and method of controlling broad beam uniformity |
Shu Satoh, Manny Sieradzki |
2010-12-28 |
$5,781,000 |
| 7615763 |
System for magnetic scanning and correction of an ion beam |
Bo H. Vanderberg, Robert D. Rathmell |
2009-11-10 |
$4,890,000 |
| 7589333 |
Methods for rapidly switching off an ion beam |
Michael Graf, William F. DiVergilio, Daniel R. Tieger |
2009-09-15 |
$3,673,000 |
| 7566886 |
Throughput enhancement for scanned beam ion implanters |
Bo H. Vanderberg |
2009-07-28 |
$1,157,000 |
| 7550751 |
Ion beam scanning control methods and systems for ion implantation uniformity |
Victor M. Benveniste, Bo H. Vanderberg |
2009-06-23 |
$2,288,000 |
| 7453074 |
Ion implanter with ionization chamber electrode design |
William F. DiVergilio |
2008-11-18 |
$809,000 |
| 7399980 |
Systems and methods for beam angle adjustment in ion implanters |
Bo H. Vanderberg |
2008-07-15 |
$6,149,000 |
| 7227160 |
Systems and methods for beam angle adjustment in ion implanters |
Bo H. Vanderberg |
2007-06-05 |
$6,071,000 |