Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9497840 | System and method for creating and utilizing dual laser curtains from a single laser in an LPP EUV light source | — | 2016-11-15 |
| 9331117 | Sensor and lithographic apparatus | Stoyan Nihtianov, Haico Victor Kok | 2016-05-03 |
| 9241395 | System and method for controlling droplet timing in an LPP EUV light source | Vahan Senekerimyan | 2016-01-19 |
| 9170498 | Lithographic apparatus and a method for determining a polarization property of a projection system using an adjustable polarizer and interferometric sensor | Marcus Adrianus Van De Kerkhof, Wilhelmus Petrus De Boeij, Hendrikus Robertus Marie Van Greevenbroek, Michel François Hubert Klaassen, Haico Victor Kok +2 more | 2015-10-27 |
| 8934083 | Lithographic apparatus and detector apparatus | Ivan Nikolaev | 2015-01-13 |
| 8809823 | System and method for controlling droplet timing and steering in an LPP EUV light source | Vahan Senekerimyan | 2014-08-19 |
| 8559108 | Grating for EUV-radiation, method for manufacturing the grating and wavefront measurement system | Borgert Kruizinga, Michiel David Nijkerk, Kornelis Frits Feenstra | 2013-10-15 |
| 8269186 | Radiation detector | Wilhelmus Jacobus Maria Rooijakkers | 2012-09-18 |
| 8124939 | Radiation detector | Wilhelmus Jacobus Maria Rooijakkers | 2012-02-28 |
| 7375799 | Lithographic apparatus | Marcus Adrianus Van De Kerkhof, Wilhelmus Petrus De Boeij, Hendrikus Robertus Marie Van Greevenbroek, Michel Fransois Hubert Klaassen, Tammo Uitterdijk | 2008-05-20 |
| 6842247 | Reticle independent reticle stage calibration | Carlo Cornelis Maria Luijten | 2005-01-11 |