Issued Patents All Time
Showing 51–75 of 76 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7265062 | Ionic additives for extreme low dielectric constant chemical formulations | Robert P. Mandal, Alexandros T. Demos, Michael P. Nault, Nikolaos Bekiaris, Scott J. Weigel +3 more | 2007-09-04 |
| 7256139 | Methods and apparatus for e-beam treatment used to fabricate integrated circuit devices | Farhad Moghadam, Jun Zhao, Rick J. Roberts, Li Xia, Alexandros T. Demos | 2007-08-14 |
| 7226853 | Method of forming a dual damascene structure utilizing a three layer hard mask structure | Nikolaos Bekiaris, Michael D. Armacost, Mehul Naik | 2007-06-05 |
| 7223526 | Method of depositing an amorphous carbon layer | Kevin Fairbairn, Michael R. Rice, Christopher S. Ngai, Ian Latchford, Christopher Dennis Bencher +1 more | 2007-05-29 |
| 6989227 | E-beam curable resist and process for e-beam curing the resist | William R. Livesay, Matthew Ross | 2006-01-24 |
| 6936551 | Methods and apparatus for E-beam treatment used to fabricate integrated circuit devices | Farhad Moghadam, Jun Zhao, Rick J. Roberts, Li-Qun Xia, Alexandros T. Demos | 2005-08-30 |
| 6896955 | Ionic additives for extreme low dielectric constant chemical formulations | Robert P. Mandal, Alexandros T. Demos, Michael P. Nault, Nikolaos Bekiaris, Scott J. Weigel +3 more | 2005-05-24 |
| 6875687 | Capping layer for extreme low dielectric constant films | Michael P. Nault, Josephine Chang | 2005-04-05 |
| 6841341 | Method of depositing an amorphous carbon layer | Kevin Fairbairn, Michael R. Rice, Christopher S. Ngai, Ian Latchford, Christopher Dennis Bencher +1 more | 2005-01-11 |
| 6818289 | Mesoporous films having reduced dielectric constants | James Edward MacDougall, Kevin Ray Heier, Scott J. Weigel, Alexandros T. Demos, Nikolaos Bekiaris +3 more | 2004-11-16 |
| 6806203 | Method of forming a dual damascene structure using an amorphous silicon hard mask | Nikolaos Bekiaris, Josephine B. Chang, Phong H. Nguyen | 2004-10-19 |
| 6780753 | Airgap for semiconductor devices | Ian Latchford, Christopher Dennis Bencher, Michael D. Armacost, Christopher S. Ngai | 2004-08-24 |
| 6592980 | Mesoporous films having reduced dielectric constants | James Edward MacDougall, Kevin Ray Heier, Scott J. Weigel, Alexandros T. Demos, Nikolaos Bekiaris +3 more | 2003-07-15 |
| 6589715 | Process for depositing and developing a plasma polymerized organosilicon photoresist film | Olivier Joubert, Cedric Monget, Dian Sugiarto, David Mui | 2003-07-08 |
| 6583071 | Ultrasonic spray coating of liquid precursor for low K dielectric coatings | Yunfeng Lu, Michael P. Nault, Michael Barnes, Farhad Moghadam | 2003-06-24 |
| 6576568 | Ionic additives for extreme low dielectric constant chemical formulations | Robert P. Mandal, Alexandros T. Demos, Michael P. Nault, Nikolaos Bekiaris, Scott J. Weigel +3 more | 2003-06-10 |
| 6573030 | Method for depositing an amorphous carbon layer | Kevin Fairbairn, Michael R. Rice, Christopher S. Ngai, Ian Latchford, Christopher Dennis Bencher +1 more | 2003-06-03 |
| 6238844 | Process for depositing a plasma polymerized organosilicon photoresist film | Olivier Joubert, Cedric Monget, Dian Sugiarto, David Mui | 2001-05-29 |
| 6090530 | Method and apparatus for depositing deep UV photoresist films | Dian Sugiarto | 2000-07-18 |
| 6013418 | Method for developing images in energy sensitive materials | Yi Ma | 2000-01-11 |
| 5885751 | Method and apparatus for depositing deep UV photoresist films | Dian Sugiarto | 1999-03-23 |
| 5635338 | Energy sensitive materials and methods for their use | Ajey M. Joshi | 1997-06-03 |
| 5439780 | Energy sensitive materials and methods for their use | Ajey M. Joshi | 1995-08-08 |
| 4921321 | Silicon network polymers | — | 1990-05-01 |
| 4830982 | Method of forming III-V semi-insulating films using organo-metallic titanium dopant precursors | Andrew G. Dentai, Charles H. Joyner, John L. Zilko | 1989-05-16 |