Issued Patents All Time
Showing 26–48 of 48 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10312061 | Vacuum apparatus for vacuum treating substrate | Haitao Yang, Yunyou Zheng, Chenglong Wu, Wei Li, Youngjin Song +2 more | 2019-06-04 |
| 10254554 | Display device and method for using the same | Xin Gai, Hui Zheng, Dongxi Li | 2019-04-09 |
| 10233547 | Methods of etching films with reduced surface roughness | Benjamin Schmiege, Nitin K. Ingle, Srinivas D. Nemani, Jeffrey W. Anthis, Xikun Wang +1 more | 2019-03-19 |
| 10180216 | Light emitting apparatus, back light unit and display apparatus | Xin Gai, Dongxi Li | 2019-01-15 |
| 10010573 | Engineered rice having alcoholism relief and liver protection function, and preparation method thereof | Shenglin Duan, Muyi Cai, Zhe Dong, Yanqiao Liu, Xue-Wen Wang +3 more | 2018-07-03 |
| 9960049 | Two-step fluorine radical etch of hafnium oxide | Hanshen Zhang, Zhenjiang Cui | 2018-05-01 |
| 9896770 | Methods of etching films with reduced surface roughness | Benjamin Schmiege, Nitin K. Ingle, Srinivas D. Nemani, Jeffrey W. Anthis, Xikun Wang +1 more | 2018-02-20 |
| 9576788 | Cleaning high aspect ratio vias | Seung Ho Park, Anchuan Wang, Zhenjiang Cui, Nitin K. Ingle | 2017-02-21 |
| 9576809 | Etch suppression with germanium | Mikhail Korolik, Nitin K. Ingle, Jingchun Zhang, Anchuan Wang | 2017-02-21 |
| 9553102 | Tungsten separation | Xikun Wang, Anchuan Wang, Nitin K. Ingle | 2017-01-24 |
| 9540736 | Methods of etching films with reduced surface roughness | Benjamin Schmiege, Nitin K. Ingle, Srinivas D. Nemani, Jeffrey W. Anthis, Xikun Wang +1 more | 2017-01-10 |
| 9478434 | Chlorine-based hardmask removal | Xikun Wang, Mandar B. Pandit, Zhenjiang Cui, Mikhail Korolik, Anchuan Wang +1 more | 2016-10-25 |
| 9449846 | Vertical gate separation | Vinod R. Purayath, Xikun Wang, Anchuan Wang, Nitin K. Ingle | 2016-09-20 |
| 9449845 | Selective titanium nitride etching | Jingchun Zhang, Anchuan Wang, Nitin K. Ingle, Seung Ho Park, Zhijun Chen +1 more | 2016-09-20 |
| 9309598 | Oxide and metal removal | Xikun Wang, Anchuan Wang, Nitin K. Ingle, Jeffrey W. Anthis, Benjamin Schmiege | 2016-04-12 |
| 9299575 | Gas-phase tungsten etch | Seung Ho Park, Xikun Wang, Anchuan Wang, Sang Jin Kim | 2016-03-29 |
| 9190293 | Even tungsten etch for high aspect ratio trenches | Xikun Wang, Anchuan Wang, Nitin K. Ingle | 2015-11-17 |
| 9067956 | Zeolite porous metal bis(imidazole) coordination polymers and preparation method thereof | Dan Li, Xiaoping Zhou | 2015-06-30 |
| 9067957 | Metal nickel-imidazolate chiral nano clathrate complex and preparation method thereof | Dan Li, Xiaoping Zhou | 2015-06-30 |
| 8951429 | Tungsten oxide processing | Xikun Wang, Seung Ho Park, Mikhail Korolik, Anchuan Wang, Nitin K. Ingle | 2015-02-10 |
| 8921234 | Selective titanium nitride etching | Jingchun Zhang, Anchuan Wang, Nitin K. Ingle, Seung Ho Park, Zhijun Chen +1 more | 2014-12-30 |
| 8871618 | In-situ fabrication method for silicon solar cell | Yang Xia, Bangwu Liu, Chaobo Li, Minggang Wang, Yongtao Li | 2014-10-28 |
| 8703591 | Method for fabricating black silicon by using plasma immersion ion implantation | Yang Xia, Bangwu Liu, Chaobo Li, Minggang Wang, Yongtao Li | 2014-04-22 |