Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6858441 | MRAM MTJ stack to conductive line alignment method | Joachim Nuetzel, Xian Jay Ning, Kia-Seng Low, Rajiv Ranade, Ravikumar Ramachandran | 2005-02-22 |
| 6849465 | Method of patterning a magnetic memory cell bottom electrode before magnetic stack deposition | Chanro Park | 2005-02-01 |
| 6806096 | Integration scheme for avoiding plasma damage in MRAM technology | Woosik Kim | 2004-10-19 |
| 6783999 | Subtractive stud formation for MRAM manufacturing | — | 2004-08-31 |
| 6740539 | Carbon-graded layer for improved adhesion of low-k dielectrics to silicon substrates | Richard A. Conti, Prakash Dev, David M. Dobuzinsky, Daniel C. Edelstein, Kia-Seng Low +3 more | 2004-05-25 |
| 6713802 | Magnetic tunnel junction patterning using SiC or SiN | — | 2004-03-30 |
| 6649531 | Process for forming a damascene structure | William J. Cote, Timothy J. Dalton, Prakash Dev, Daniel C. Edelstein, Scott D. Halle +1 more | 2003-11-18 |
| 6607984 | Removable inorganic anti-reflection coating process | Scott D. Halle, Jochen Beintner | 2003-08-19 |
| 6570256 | Carbon-graded layer for improved adhesion of low-k dielectrics to silicon substrates | Richard A. Conti, Prakash Dev, David M. Dobuzinsky, Daniel C. Edelstein, Kia-Seng Low +3 more | 2003-05-27 |
| 6531412 | Method for low temperature chemical vapor deposition of low-k films using selected cyclosiloxane and ozone gases for semiconductor applications | Richard A. Conti, Daniel C. Edelstein | 2003-03-11 |
| 6300672 | Silicon oxynitride cap for fluorinated silicate glass film in intermetal dielectric semiconductor fabrication | — | 2001-10-09 |
| 6281084 | Disposable spacers for improved array gapfill in high density DRAMs | Hiroyuki Akatsu, Ramachandra Divakaruni | 2001-08-28 |
| 6184091 | Formation of controlled trench top isolation layers for vertical transistors | Ulrike Gruening, Jochen Beintner, Dirk Tobben, Oswald Spindler, Zvonimir Gabric | 2001-02-06 |
| 6177698 | Formation of controlled trench top isolation layers for vertical transistors | Ulrike Gruening, Jochen Beintner, Dirk Tobben, Oswald Spindler, Zvonimir Gabric | 2001-01-23 |
| 6103456 | Prevention of photoresist poisoning from dielectric antireflective coating in semiconductor fabrication | Dirk Tobben | 2000-08-15 |
| 6060132 | High density plasma CVD process for making dielectric anti-reflective coatings | — | 2000-05-09 |
| 6020091 | Hard etch mask | — | 2000-02-01 |
| 6008120 | Silicon oxynitride cap for fluorinated silicate glass film in intermetal dielectric semiconductor fabrication | — | 1999-12-28 |
| 5955380 | Endpoint detection method and apparatus | — | 1999-09-21 |