Issued Patents All Time
Showing 26–36 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6740534 | Determination of a process flow based upon fault detection analysis | Ernest D. Adams, III, Gregory A. Cherry, Eric O. Green, Elfido Coss, Jr., Brian K. Cusson +2 more | 2004-05-25 |
| 6734088 | Control of two-step gate etch process | Scott Bushman, James H. Hussey, Jr., Douglas J. Bonser | 2004-05-11 |
| 6728591 | Method and apparatus for run-to-run control of trench profiles | James H. Hussey, Jr. | 2004-04-27 |
| 6708129 | Method and apparatus for wafer-to-wafer control with partial measurement data | Alexander J. Pasadyn | 2004-03-16 |
| 6639663 | Method and apparatus for detecting processing faults using scatterometry measurements | Richard J. Markle | 2003-10-28 |
| 6562635 | Method of controlling metal etch processes, and system for accomplishing same | Kevin R. Lensing, James Broc Stirton | 2003-05-13 |
| 6555397 | Dry isotropic removal of inorganic anti-reflective coating after poly gate etching | Douglas J. Bonser, James H. Hussey, Jr. | 2003-04-29 |
| 6409879 | System for controlling transistor spacer width | Anthony J. Toprac, John R. Behnke | 2002-06-25 |
| 6365481 | Isotropic resistor protect etch to aid in residue removal | Douglas J. Bonser | 2002-04-02 |
| 6245581 | Method and apparatus for control of critical dimension using feedback etch control | Douglas J. Bonser, Anthony J. Toprac, John R. Behnke, James H. Hussey, Jr. | 2001-06-12 |
| 6133132 | Method for controlling transistor spacer width | Anthony J. Toprac, John R. Behnke | 2000-10-17 |