Issued Patents All Time
Showing 26–50 of 78 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6849516 | Methods of forming drain/source extension structures of a field effect transistor using a doped high-k dielectric layer | Thomas Feudel, Manfred Horstmann, Stephan Kruegel | 2005-02-01 |
| 6838363 | Circuit element having a metal silicide region thermally stabilized by a barrier diffusion material | Thorsten Kammler, Manfred Horstmann | 2005-01-04 |
| 6821887 | Method of forming a metal silicide gate in a standard MOS process sequence | Stephan Kruegel, Manfred Horstmann, Thomas Feudel | 2004-11-23 |
| 6821840 | Semiconductor device including a field effect transistor and a passive capacitor having reduced leakage current and an improved capacitance per unit area | Gert Burbach, Thomas Feudel | 2004-11-23 |
| 6812074 | SOI field effect transistor element having a recombination region and method of forming same | Manfred Horstmann, Christian Krueger | 2004-11-02 |
| 6812159 | Method of forming a low leakage dielectric layer providing an increased capacitive coupling | Falk Graetsch, Lutz Herrmann | 2004-11-02 |
| 6812115 | Method of filling an opening in a material layer with an insulating material | Stephan Kruegel, Michael Raab | 2004-11-02 |
| 6806126 | Method of manufacturing a semiconductor component | Scott Luning, Thorsten Kammler | 2004-10-19 |
| 6806153 | Method of manufacturing a field effect transistor | Manfred Horstmann, Thomas Feudel | 2004-10-19 |
| 6798028 | Field effect transistor with reduced gate delay and method of fabricating the same | Manfred Horstmann, Rolf Stephan, Stephan Kruegel | 2004-09-28 |
| 6770552 | Method of forming a semiconductor device having T-shaped gate structure | Manfred Horstmann, Rolf Stephan | 2004-08-03 |
| 6754553 | Implant monitoring using multiple implanting and annealing steps | Manfred Horstmann, Christian Krueger | 2004-06-22 |
| 6746927 | Semiconductor device having a polysilicon line structure with increased metal silicide portions and method for forming the polysilicon line structure of a semiconductor device | Thorsten Kammler, Christof Streck | 2004-06-08 |
| 6723663 | Technique for forming an oxide/nitride layer stack by controlling the nitrogen ion concentration in a nitridation plasma | Falk Graetsch, Lutz Herrmann | 2004-04-20 |
| 6703278 | Method of forming layers of oxide on a surface of a substrate | Falk Graetsch, Stephan Kruegel | 2004-03-09 |
| 6673665 | Semiconductor device having increased metal silicide portions and method of forming the semiconductor | Manfred Horstmann, Rolf Stephan | 2004-01-06 |
| 6620718 | Method of forming metal silicide regions on a gate electrode and on the source/drain regions of a semiconductor device | Michael Raab, Rolf Stephan | 2003-09-16 |
| 6593197 | Sidewall spacer based fet alignment technology | Manfred Horstmann, Rolf Stephan, Michael Raab | 2003-07-15 |
| 6566718 | Field effect transistor with an improved gate contact and method of fabricating the same | Rolf Stephan, Manfred Horstmann, Stephan Kruegel | 2003-05-20 |
| 6555892 | Semiconductor device with reduced line-to-line capacitance and cross talk noise | Manfred Horstmann, Frederick N. Hause | 2003-04-29 |
| 6541863 | Semiconductor device having a reduced signal processing time and a method of fabricating the same | Manfred Horstmann, Gert Burbach | 2003-04-01 |
| 6491799 | Method for forming a thin dielectric layer | Frederick N. Hause, Manfred Horstmann | 2002-12-10 |
| 6492210 | Method for fully self-aligned FET technology | Manfred Horstmann, Rolf Stephan, Michael Raab | 2002-12-10 |
| 6436724 | Method of monitoring the temperature of a rapid thermal anneal process in semiconductor manufacturing and a test wafer for use in this method | Manfred Horstmann, Christian Krüger | 2002-08-20 |
| 6423634 | Method of forming low resistance metal silicide region on a gate electrode of a transistor | Michael Raab, Rolf Stephan | 2002-07-23 |