Issued Patents All Time
Showing 26–50 of 109 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8288198 | Low temperature deposition of phase change memory materials | Jeffrey F. Roeder, Thomas H. Baum, Bryan C. Hendrix, Gregory T. Stauf, William Hunks +2 more | 2012-10-16 |
| 8268665 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Jeffrey F. Roeder, Thomas H. Baum, Matthias Stender +3 more | 2012-09-18 |
| 8241704 | Chemical vapor deposition of high conductivity, adherent thin films of ruthenium | Bryan C. Hendrix, James Welch, Steven M. Bilodeau, Jeffrey F. Roeder, Thomas H. Baum | 2012-08-14 |
| 8242032 | Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same | Ziyun Wang, Thomas H. Baum | 2012-08-14 |
| 8236097 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Thomas H. Baum, Bryan C. Hendrix, Jeffrey F. Roeder | 2012-08-07 |
| 8206784 | Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films | Tianniu Chen, Thomas M. Cameron, Jeffrey F. Roeder, Thomas H. Baum | 2012-06-26 |
| 8168811 | Precursors for CVD/ALD of metal-containing films | Thomas M. Cameron, Tianniu Chen | 2012-05-01 |
| 8153833 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Ravi Laxman, Thomas H. Baum, Bryan C. Hendrix, Jeffrey F. Roeder | 2012-04-10 |
| 8093140 | Amorphous Ge/Te deposition process | Philip S. H. Chen, William Hunks, Tianniu Chen, Matthias Stender, Jeffrey F. Roeder +1 more | 2012-01-10 |
| 8053375 | Super-dry reagent compositions for formation of ultra low k films | Jeffrey F. Roeder, Thomas H. Baum, Steven M. Bilodeau, Scott L. Battle, William Hunks +1 more | 2011-11-08 |
| 8034407 | Chemical vapor deposition of high conductivity, adherent thin films of ruthenium | Bryan C. Hendrix, James Welch, Steven M. Bilodeau, Jeffrey F. Roeder, Thomas H. Baum | 2011-10-11 |
| 8008117 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Jeffrey F. Roeder, Thomas H. Baum, Melissa A. Petruska +4 more | 2011-08-30 |
| 7964746 | Copper precursors for CVD/ALD/digital CVD of copper metal films | Tianniu Chen, Thomas H. Baum, Bryan C. Hendrix, Jeffrey F. Roeder, Juan E. Dominguez +2 more | 2011-06-21 |
| 7910765 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Ravi Laxman, Thomas H. Baum, Bryan C. Hendrix, Jeffrey F. Roeder | 2011-03-22 |
| 7887883 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Thomas H. Baum, Bryan C. Hendrix, Jeffrey F. Roeder | 2011-02-15 |
| 7863203 | Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same | Ziyun Wang, Thomas H. Baum | 2011-01-04 |
| 7858816 | Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films | Tianniu Chen, Jeffrey F. Roeder, Thomas H. Baum | 2010-12-28 |
| 7838329 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Jeffrey F. Roeder, Thomas H. Baum, Melissa A. Petruska +4 more | 2010-11-23 |
| 7838073 | Tantalum amide complexes for depositing tantalum-containing films, and method of making same | Tianniu Chen, Thomas H. Baum | 2010-11-23 |
| 7786320 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Ravi Laxman, Thomas H. Baum, Bryan C. Hendrix, Jeffrey F. Roeder | 2010-08-31 |
| 7781605 | Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films | Ziyun Wang, Bryan C. Hendrix, Jeffrey F. Roeder, Tianniu Chen, Thomas H. Baum | 2010-08-24 |
| 7750173 | Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films | Tianniu Chen, Jeffrey F. Roeder, Thomas H. Baum | 2010-07-06 |
| 7713346 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Thomas H. Baum, Bryan C. Hendrix, Jeffrey F. Roeder | 2010-05-11 |
| 7709384 | Tantalum amide complexes for depositing tantalum-containing films, and method of making same | Tianniu Chen, Thomas H. Baum | 2010-05-04 |
| 7638074 | Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films | Tianniu Chen, Thomas M. Cameron, Jeffrey F. Roeder, Thomas H. Baum | 2009-12-29 |