Issued Patents All Time
Showing 51–75 of 109 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7605093 | Method of fabricating iridium-based materials and structures on substrates, and iridium source reagents therefor | Thomas H. Baum | 2009-10-20 |
| 7601860 | Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films | Ziyun Wang, Bryan C. Hendrix, Jeffrey F. Roeder, Tianniu Chen, Thomas H. Baum | 2009-10-13 |
| 7579496 | Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same | Ziyun Wang, Thomas H. Baum | 2009-08-25 |
| 7531679 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Ravi Laxman, Thomas H. Baum, Bryan C. Hendrix, Jeffrey F. Roeder | 2009-05-12 |
| 7531031 | Copper (I) compounds useful as deposition precursors of copper thin films | Alexander Borovik, Thomas H. Baum | 2009-05-12 |
| 7517809 | Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations | Michael B. Korzenski, Thomas H. Baum, Eliodor G. Ghenciu | 2009-04-14 |
| 7485611 | Supercritical fluid-based cleaning compositions and methods | Jeffrey F. Roeder, Thomas H. Baum, Matthew Healy | 2009-02-03 |
| 7456488 | Porogen material | Alexander Borovik, Thomas H. Baum | 2008-11-25 |
| 7446217 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Thomas H. Baum, Bryan C. Hendrix, Jeffrey F. Roeder | 2008-11-04 |
| 7439318 | Method for trace water analysis in cyclic siloxanes useful as precursors for low dielectric constant thin films | Alexander Borovik, Ziyun Wang, Thomas H. Baum | 2008-10-21 |
| 7437060 | Delivery systems for efficient vaporization of precursor source material | Luping Wang, Thomas H. Baum | 2008-10-14 |
| 7423166 | Stabilized cyclosiloxanes for use as CVD precursors for low-dielectric constant thin films | Tianniu Chen, Thomas H. Baum, Ravi Laxman, Alexander Borovik | 2008-09-09 |
| 7371878 | Tantalum amide complexes for depositing tantalum-containing films, and method of making same | Tianniu Chen, Thomas H. Baum | 2008-05-13 |
| 7371880 | Copper (I) compounds useful as deposition precursors of copper thin films | Alexander Borovik, Thomas H. Baum | 2008-05-13 |
| 7342295 | Porogen material | Alexander Borovik, Thomas H. Baum | 2008-03-11 |
| 7326673 | Treatment of semiconductor substrates using long-chain organothiols or long-chain acetates | David W. Minsek, Thomas H. Baum, Matthew Healy | 2008-02-05 |
| 7294528 | Supercritical fluid-assisted deposition of materials on semiconductor substrates | Thomas H. Baum | 2007-11-13 |
| 7285308 | Chemical vapor deposition of high conductivity, adherent thin films of ruthenium | Bryan C. Hendrix, James Welch, Steven M. Bilodeau, Jeffrey F. Roeder, Thomas H. Baum | 2007-10-23 |
| 7241912 | Copper (I) compounds useful as deposition precursors of copper thin films | Alexander Borovik, Thomas H. Baum | 2007-07-10 |
| 7226640 | Method of fabricating iridium-based materials and structures on substrates | Thomas H. Baum | 2007-06-05 |
| 7223352 | Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal | Michael B. Korzenski, Eliodor G. Ghenciu, Thomas H. Baum | 2007-05-29 |
| 7208427 | Precursor compositions and processes for MOCVD of barrier materials in semiconductor manufacturing | Jeffrey F. Roeder, Bryan C. Hendrix, Thomas H. Baum | 2007-04-24 |
| 7198815 | Tantalum amide complexes for depositing tantalum-containing films, and method of making same | Tianniu Chen, Thomas H. Baum | 2007-04-03 |
| 7189571 | Method for trace water analysis in cyclic siloxanes useful as precursors for low dielectric constant thin films | Alexander Borovik, Ziyun Wang, Thomas H. Baum | 2007-03-13 |
| 7166732 | Copper (I) compounds useful as deposition precursors of copper thin films | Alexander Borovik, Thomas H. Baum | 2007-01-23 |