Issued Patents 2024
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12183605 | In-situ semiconductor processing chamber temperature apparatus | Andrew Nguyen, Yogananda SARODE, Xue Yang Chang | 2024-12-31 |
| 12163218 | Continuous liner for use in a processing chamber | James D. Carducci, Kenneth S. Collins | 2024-12-10 |
| 12136537 | Cost effective radio frequency impedance matching networks | Yue Guo, Farhad Moghadam, Yang Yang | 2024-11-05 |
| 12130561 | Gas distribution plate with UV blocker | Michael D. Willwerth, Yang Yang | 2024-10-29 |
| 12125689 | Methods and apparatus for toroidal plasma generation | Andrew Nguyen, Yang Yang, Sathya Swaroop Ganta, Fernando Silveira, Yue Guo +1 more | 2024-10-22 |
| 12111341 | In-situ electric field detection method and apparatus | Yue Guo, Yang Yang, Fernando Silveira, A N M Wasekul AZAD | 2024-10-08 |
| 12106938 | Distortion current mitigation in a radio frequency plasma processing chamber | Yue Guo, Yang Yang | 2024-10-01 |
| 12094716 | Chambers and coatings for reducing backside damage | Leonard Tedeschi, Benjamin Schwarz, Changgong Wang, Vahid Firouzdor, Sumanth Banda +1 more | 2024-09-17 |
| 12080519 | Smart dynamic load simulator for RF power delivery control system | Jie Yu, Yue Guo, Tao Zhang, Shahid Rauf, John C. Forster +2 more | 2024-09-03 |
| 12046449 | Methods and apparatus for processing a substrate | Yue Guo, Katsumasa Kawasaki, Yang Yang, Nicolas Bright | 2024-07-23 |
| 12020901 | RF impedance matching networks for substrate processing platform | Yue Guo, Krishna Kumar Kuttannair, Jie Yu, Yang Yang | 2024-06-25 |
| 11972924 | Pulsed voltage source for plasma processing applications | A N M Wasekul AZAD, Yang Yang, Yue Guo, Fernando Silveira | 2024-04-30 |
| 11967483 | Plasma excitation with ion energy control | Yang Yang, Yue Guo | 2024-04-23 |
| 11948826 | High power electrostatic chuck design with radio frequency coupling | Jaeyong Cho, Vijay D. Parkhe, Haitao Wang, Chunlei Zhang | 2024-04-02 |
| 11935724 | Symmetric VHF source for a plasma reactor | Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins, Shahid Rauf +3 more | 2024-03-19 |
| 11915850 | Two channel cosine-theta coil assembly | Richard Fovell, Larry D. Elizaga | 2024-02-27 |
| 11894255 | Sheath and temperature control of process kit | Jaeyong Cho, Daniel Sang Byun | 2024-02-06 |