DO

David L. O'Meara

TL Tokyo Electron Limited: 6 patents #18 of 865Top 3%
📍 Albany, NY: #11 of 154 inventorsTop 8%
🗺 New York: #445 of 11,993 inventorsTop 4%
Overall (2023): #23,333 of 537,848Top 5%
6
Patents 2023

Issued Patents 2023

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
11823910 Systems and methods for improving planarity using selective atomic layer etching (ALE) Anthony Dip, Masanobu Igeta 2023-11-21
11742241 ALD (atomic layer deposition) liner for via profile control and related applications Xinghua Sun, Yen-Tien Lu, Angelique Raley, Jeffrey Smith 2023-08-29
11651967 Non-atomic layer deposition (ALD) method of forming sidewall passivation layer during high aspect ratio carbon layer etch Shihsheng Chang, Andrew Metz, Yun Han 2023-05-16
11621164 Method for critical dimension (CD) trim of an organic pattern used for multi-patterning purposes Katie Lutker-Lee, Angelique Raley 2023-04-04
11621190 Method for filling recessed features in semiconductor devices with a low-resistivity metal Kai-Hung Yu, Nicholas Joy, Gyanaranjan Pattanaik, Robert D. Clark, Kandabara Tapily +3 more 2023-04-04
11567407 Method for globally adjusting spacer critical dimension using photo-active self-assembled monolayer Richard A. Farrell, Hoyoung Kang 2023-01-31