Issued Patents 2023
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11651967 | Non-atomic layer deposition (ALD) method of forming sidewall passivation layer during high aspect ratio carbon layer etch | Shihsheng Chang, David L. O'Meara, Andrew Metz | 2023-05-16 |
| 11605539 | Defect correction on metal resists | Peter L. G. Ventzek, Alok Ranjan | 2023-03-14 |