BA

Brent A. Anderson

IBM: 13 patents #78 of 6,852Top 2%
📍 Jericho, VT: #3 of 18 inventorsTop 20%
🗺 Vermont: #13 of 432 inventorsTop 4%
Overall (2023): #5,086 of 537,848Top 1%
13
Patents 2023

Issued Patents 2023

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
11855191 Vertical FET with contact to gate above active fin Junli Wang, Indira Seshadri, Chen Zhang, Ruilong Xie, Joshua M. Rubin +1 more 2023-12-26
11842961 Advanced metal interconnects with a replacement metal Lawrence A. Clevenger, Kisik Choi, Nicholas Anthony Lanzillo 2023-12-12
11830774 Buried contact through fin-to-fin space for vertical transport field effect transistor Junli Wang 2023-11-28
11823998 Top via with next level line selective growth Lawrence A. Clevenger, Christopher J. Penny, Nicholas Anthony Lanzillo, Kisik Choi, Robert R. Robison 2023-11-21
11804406 Top via cut fill process for line extension reduction Christopher J. Penny, Lawrence A. Clevenger, Kisik Choi, Nicholas Anthony Lanzillo, Robert R. Robison 2023-10-31
11791258 Conductive lines with subtractive cuts Lawrence A. Clevenger, Kisik Choi, Nicholas Anthony Lanzillo, Christopher J. Penny, Robert R. Robison 2023-10-17
11764298 VTFET with buried power rails Chen Zhang, Ruilong Xie, Heng Wu, Junli Wang 2023-09-19
11710666 Dummy fin template to form a self-aligned metal contact for output of vertical transport field effect transistor Junli Wang, Albert M. Young 2023-07-25
11688775 Method of forming first and second contacts self-aligned top source/drain region of a vertical field-effect transistor Juntao Li, Kangguo Cheng 2023-06-27
11670542 Stepped top via for via resistance reduction Lawrence A. Clevenger, Christopher J. Penny, Kisik Choi, Nicholas Anthony Lanzillo, Robert R. Robison 2023-06-06
11658116 Interconnects on multiple sides of a semiconductor structure Junli Wang, Albert M. Chu, Dechao Guo 2023-05-23
11600565 Top via stack Lawrence A. Clevenger, Christopher J. Penny, Kisik Choi, Nicholas Anthony Lanzillo, Robert R. Robison 2023-03-07
11563003 Fin top hard mask formation after wafer flipping process Chen Zhang, Tenko Yamashita, Joshua M. Rubin 2023-01-24