| 11164753 |
Self-aligned double patterning with spatial atomic layer deposition |
Ning Li, Victor Nguyen, Mihaela Balseanu, Keiichi Tanaka, Steven Marcus |
2021-11-02 |
| 11158489 |
Methods and systems to modulate film stress |
Tsutomu Tanaka, John C. Forster, Ran Liu, Kenichi Ohno, Ning Li +2 more |
2021-10-26 |
| 11081318 |
Geometrically selective deposition of dielectric films utilizing low frequency bias |
Kenichi Ohno, Keiichi Tanaka, Tsutomu Tanaka, Dmitry A. Dzilno, Mario David Silvetti +4 more |
2021-08-03 |
| 11028478 |
Atomic layer deposition of films comprising silicon, carbon and nitrogen using halogenated silicon precursors |
Victor Nguyen, Ning Li, Mihaela Balseanu, Mark Saly, David Thompson |
2021-06-08 |
| 11017997 |
Methods and apparatus for low temperature silicon nitride films |
Wenbo Yan, Cong Trinh, Ning Li, Mihaela Balseanu, Maribel Maldonado-Garcia |
2021-05-25 |
| 10957532 |
Method and apparatus for deposition of low-k films |
Ning Li, Zhelin Sun, Mihaela Balseanu, Bhaskar Jyoti Bhuyan, Mark Saly |
2021-03-23 |
| 10943780 |
Methods for ALD of metal oxides on metal surfaces |
Bhaskar Jyoti Bhuyan, Mark Saly, David Thompson |
2021-03-09 |
