Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11164753 | Self-aligned double patterning with spatial atomic layer deposition | Ning Li, Mihaela Balseanu, Li-Qun Xia, Keiichi Tanaka, Steven Marcus | 2021-11-02 |
| 11028478 | Atomic layer deposition of films comprising silicon, carbon and nitrogen using halogenated silicon precursors | Ning Li, Mihaela Balseanu, Li-Qun Xia, Mark Saly, David Thompson | 2021-06-08 |