Issued Patents 2020
Showing 26–34 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10714485 | Semiconductor device which includes Fins | Chih-Liang Chen, Chih-Ming Lai, Charles Chew-Yuen Young, Chin-Yuan Tseng, Jiann-Tyng Tzeng +3 more | 2020-07-14 |
| 10707081 | Fine line patterning methods | Shih-Chun Huang, Chiu-Hsiang Chen, Ya-Wen Yeh, Yu-Tien Shen, Po-Chin Chang +7 more | 2020-07-07 |
| 10698320 | Method for optimized wafer process simulation | Shih-Ming Chang, Shuo-Yen Chou, Zengqin Zhao, Chien-Wen Lai | 2020-06-30 |
| 10678142 | Optical proximity correction and photomasks | Dong-Yo Jheng, Ken-Hsien Hsieh, Shih-Ming Chang, Chih-Jie Lee, Shuo-Yen Chou | 2020-06-09 |
| 10665467 | Spacer etching process for integrated circuit design | Cheng-Hsiung Tsai, Chung-Ju Lee, Chih-Ming Lai, Chia-Ying Lee, Jyu-Horng Shieh +6 more | 2020-05-26 |
| 10658184 | Pattern fidelity enhancement with directional patterning technology | Yu-Tien Shen, Chi-Cheng Hung, Chin-Hsiang Lin, Chien-Wei Wang, Ching-Yu Chang +7 more | 2020-05-19 |
| 10565348 | System for and method of fabricating an integrated circuit | Wei-Cheng Lin, Chih-Liang Chen, Chih-Ming Lai, Charles Chew-Yuen Young, Jiann-Tyng Tzeng +3 more | 2020-02-18 |
| 10535646 | Systems and methods for a sequential spacer scheme | Shih-Ming Chang, Ming-Feng Shieh, Tsai-Sheng Gau | 2020-01-14 |
| 10535520 | Fin patterning methods for increased process margins | Chin-Yuan Tseng, Wei-Liang Lin, Li-Te Lin, Min Cao | 2020-01-14 |