Issued Patents 2018
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10162257 | Extreme ultraviolet lithography system, device, and method for printing low pattern density features | Yen-Cheng Lu, Shinn-Sheng Yu, Jeng-Horng Chen | 2018-12-25 |
| 10162258 | Pellicle fabrication methods and structures thereof | Yun-Yue Lin, Hsuan-Chen Chen, Chih-Cheng Lin, Hsin-Chang Lee, Yao-Ching Ku +3 more | 2018-12-25 |
| 10156790 | EUV lithography system and method with optimized throughput and stability | Yen-Cheng Lu, Jeng-Horng Chen, Shun-Der Wu | 2018-12-18 |
| 10036951 | Pellicle assembly and fabrication methods thereof | Pei-Cheng Hsu, Chih-Cheng Lin, Hsin-Chang Lee, Ta-Cheng Lien | 2018-07-31 |
| 10031411 | Pellicle for EUV mask and fabrication thereof | Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen | 2018-07-24 |
| 10007174 | Extreme ultraviolet lithography process and mask | Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen | 2018-06-26 |
| 10001701 | Pellicle structures and methods of fabricating thereof | Pei-Cheng Hsu, Hsin-Chang Lee, Yun-Yue Lin, Hsuan-Chen Chen, Hsuan-I WANG | 2018-06-19 |
| 9996013 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Jeng-Horng Chen, Shinn-Sheng Yu | 2018-06-12 |
| 9995999 | Lithography mask | Yun-Yue Lin, Hsin-Chang Lee, Chia-Jen Chen | 2018-06-12 |
| 9964850 | Method to mitigate defect printability for ID pattern | Yen-Cheng Lu, Chia-Hao Hsu, Shinn-Sheng Yu, Chia-Chen Chen, Jeng-Horng Chen | 2018-05-08 |
| 9897910 | Treating a capping layer of a mask | Pei-Cheng Hsu, Chih-Cheng Lin, Ta-Cheng Lien, Wei-Shiuan Chen, Hsin-Chang Lee | 2018-02-20 |
| 9886543 | Method providing for asymmetric pupil configuration for an extreme ultraviolet lithography process | Chia-Chun Chung, Norman Chen, Chih-Tsung Shih, Jeng-Horng Chen, Shinn-Sheng Yu | 2018-02-06 |
| 9869928 | Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof | Tao Huang, Chih-Tsung Shih, Chia-Jen Chen, Hsin-Chang Lee | 2018-01-16 |
| 9870612 | Method for repairing a mask | Shinn-Sheng Yu, Wen-Chuan Wang, Sheng-Chi Chin | 2018-01-16 |
| 9869939 | Lithography process | Shinn-Sheng Yu | 2018-01-16 |