Issued Patents 2018
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10162257 | Extreme ultraviolet lithography system, device, and method for printing low pattern density features | Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen | 2018-12-25 |
| 10156790 | EUV lithography system and method with optimized throughput and stability | Jeng-Horng Chen, Shun-Der Wu, Anthony Yen | 2018-12-18 |
| 9996013 | Extreme ultraviolet lithography process and mask | Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen | 2018-06-12 |
| 9964850 | Method to mitigate defect printability for ID pattern | Chia-Hao Hsu, Shinn-Sheng Yu, Chia-Chen Chen, Jeng-Horng Chen, Anthony Yen | 2018-05-08 |