Issued Patents 2018
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10162257 | Extreme ultraviolet lithography system, device, and method for printing low pattern density features | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2018-12-25 |
| 10031411 | Pellicle for EUV mask and fabrication thereof | Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2018-07-24 |
| 10007174 | Extreme ultraviolet lithography process and mask | Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2018-06-26 |
| 9996013 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2018-06-12 |
| 9964850 | Method to mitigate defect printability for ID pattern | Yen-Cheng Lu, Chia-Hao Hsu, Chia-Chen Chen, Jeng-Horng Chen, Anthony Yen | 2018-05-08 |
| 9886543 | Method providing for asymmetric pupil configuration for an extreme ultraviolet lithography process | Chia-Chun Chung, Norman Chen, Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2018-02-06 |
| 9869934 | Collector in an extreme ultraviolet lithography system with optimal air curtain protection | Chia-Ching Huang, Tsung-Yu Chen, Chia-Hao Hsu, Chia-Chen Chen | 2018-01-16 |
| 9870612 | Method for repairing a mask | Anthony Yen, Wen-Chuan Wang, Sheng-Chi Chin | 2018-01-16 |
| 9869939 | Lithography process | Anthony Yen | 2018-01-16 |