Issued Patents 2018
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10162257 | Extreme ultraviolet lithography system, device, and method for printing low pattern density features | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2018-12-25 |
| 10156790 | EUV lithography system and method with optimized throughput and stability | Yen-Cheng Lu, Shun-Der Wu, Anthony Yen | 2018-12-18 |
| 10067418 | Particle removal system and method thereof | Shu-Hao Chang, Chi-Lun Lu, Shang-Chieh Chien, Ming-Chin Chien, Jui-Ching Wu +2 more | 2018-09-04 |
| 10061191 | High durability extreme ultraviolet photomask | Chia-Hao Yu, Chi-Lun Lu, Chih-Tsung Shih, Ching-Wei Shen | 2018-08-28 |
| 10031411 | Pellicle for EUV mask and fabrication thereof | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2018-07-24 |
| 10018920 | Lithography patterning with a gas phase resist | Shu-Hao Chang, Kuo-Chang Kau, Kevin Huang | 2018-07-10 |
| 10007174 | Extreme ultraviolet lithography process and mask | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2018-06-26 |
| 9996013 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2018-06-12 |
| 9964850 | Method to mitigate defect printability for ID pattern | Yen-Cheng Lu, Chia-Hao Hsu, Shinn-Sheng Yu, Chia-Chen Chen, Anthony Yen | 2018-05-08 |
| 9886543 | Method providing for asymmetric pupil configuration for an extreme ultraviolet lithography process | Chia-Chun Chung, Norman Chen, Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2018-02-06 |