SD

Sansaptak Dasgupta

IN Intel: 13 patents #97 of 5,158Top 2%
Overall (2018): #3,602 of 503,207Top 1%
13
Patents 2018

Issued Patents 2018

Patent #TitleCo-InventorsDate
10134727 High breakdown voltage III-N depletion mode MOS capacitors Han Wui Then, Gerhard Schrom, Valluri Rao, Robert S. Chau 2018-11-20
10096683 Group III-N transistor on nanoscale template structures Han Wui Then, Marko Radosavljevic, Benjamin Chu-Kung, Sanaz K. Gardner, Seung Hoon Sung +1 more 2018-10-09
10096682 III-N devices in Si trenches Han Wui Then, Sanaz K. Gardner, Seung Hoon Sung, Marko Radosavljevic, Benjamin Chu-Kung +3 more 2018-10-09
10096474 Methods and structures to prevent sidewall defects during selective epitaxy Niloy Mukherjee, Niti Goel, Sanaz K. Gardner, Pragyansri Pathi, Matthew V. Metz +6 more 2018-10-09
10056456 N-channel gallium nitride transistors Han Wui Then, Marko Radosavljevic, Seung Hoon Sung, Sanaz K. Gardner, Robert S. Chau 2018-08-21
10050015 Multi-device flexible electronics system on a chip (SOC) process integration Ravi Pillarisetty, Niloy Mukherjee, Brian S. Doyle, Marko Radosavljevic, Han Wui Then 2018-08-14
10032911 Wide band gap transistor on non-native semiconductor substrate Han Wui Then, Robert S. Chau, Marko Radosavljevic, Benjamin Chu-Kung, Seung Hoon Sung +2 more 2018-07-24
9972686 Germanium tin channel transistors Ravi Pillarisetty, Van H. Le, Willy Rachmady, Roza Kotlyar, Marko Radosavljevic +4 more 2018-05-15
9935191 High electron mobility transistor fabrication process on reverse polarized substrate by layer transfer Kimin Jun, Alejandro X. Levander, Patrick Morrow 2018-04-03
9923087 Self-aligned structures and methods for asymmetric GaN transistors and enhancement mode operation Han Wui Then, Marko Radosavljevic, Niloy Mukherjee, Niti Goel, Sanaz K. Gardner +3 more 2018-03-20
9922826 Integrated circuit die having reduced defect group III-nitride layer and methods associated therewith Han Wui Then, Marko Radosavljevic, Robert S. Chau, Sanaz K. Gardner, Seung Hoon Sung 2018-03-20
9905651 GE and III-V channel semiconductor devices having maximized compliance and free surface relaxation Ravi Pillarisetty, Niti Goel, Van H. Le, Marko Radosavljevic, Gilbert Dewey +8 more 2018-02-27
9865684 Nanoscale structure with epitaxial film having a recessed bottom portion Benjamin Chu-Kung, Van H. Le, Robert S. Chau, Gilbert Dewey, Niti Goel +8 more 2018-01-09