Issued Patents 2018
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10163721 | Hybridization fin reveal for uniform fin reveal depth across different fin pitches | Zhenxing Bi, Donald F. Canaperi, Thamarai S. Devarajan, Sivananda K. Kanakasabapathy, Peng Xu | 2018-12-25 |
| 10141426 | Vertical transistor device | Brent A. Anderson, Huiming Bu, Shogo Mochizuki, Junli Wang | 2018-11-27 |
| 10121853 | Structure and process to tuck fin tips self-aligned to gates | Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Derrick Liu +2 more | 2018-11-06 |
| 10121852 | Structure and process to tuck fin tips self-aligned to gates | Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Derrick Liu +2 more | 2018-11-06 |
| 10121785 | Pitch scalable active area patterning structure and process for multi-channel fin FET technologies | Sivananda K. Kanakasabapathy, Eric R. Miller, Stuart A. Sieg | 2018-11-06 |
| 10090302 | Self-aligned shallow trench isolation and doping for vertical fin transistors | Brent A. Anderson, Junli Wang | 2018-10-02 |
| 10083962 | Fabrication of fin field effect transistors for complementary metal oxide semiconductor devices including separate n-type and p-type source/drains using a single spacer deposition | Kangguo Cheng, Eric R. Miller, Sean Teehan | 2018-09-25 |
| 10084068 | Self-aligned finFET formation | Cheng Chi, Chi-Chun Liu, Ruilong Xie | 2018-09-25 |
| 10074730 | Forming stacked nanowire semiconductor device | Marc A. Bergendahl, Kangguo Cheng, Eric R. Miller, Jeffrey C. Shearer, John R. Sporre +1 more | 2018-09-11 |
| 10043801 | Air gap spacer for metal gates | Marc A. Bergendahl, Kangguo Cheng, Eric R. Miller, John R. Sporre, Sean Teehan | 2018-08-07 |
| 10043760 | Registration mark formation during sidewall image transfer process | David J. Conklin, Allen H. Gabor, Sivananda K. Kanakasabapathy, Byeong Y. Kim, Stuart A. Sieg | 2018-08-07 |
| 10032680 | Strained finFET device fabrication | Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Stuart A. Sieg | 2018-07-24 |
| 10014391 | Vertical transport field effect transistor with precise gate length definition | Marc A. Bergendahl, Kangguo Cheng, Eric R. Miller, John R. Sporre, Sean Teehan | 2018-07-03 |
| 10002962 | Vertical FET structure | Brent A. Anderson, Huiming Bu, Edward J. Nowak, Junli Wang | 2018-06-19 |
| 9997369 | Margin for fin cut using self-aligned triple patterning | Gauri Karve, Eric R. Miller, Stuart A. Sieg, John R. Sporre, Sean Teehan | 2018-06-12 |
| 9935015 | Hybridization fin reveal for uniform fin reveal depth across different fin pitches | Zhenxing Bi, Donald F. Canaperi, Thamarai S. Devarajan, Sivananda K. Kanakasabapathy, Peng Xu | 2018-04-03 |
| 9929020 | Method for fin formation with a self-aligned directed self-assembly process and cut-last scheme | Cheng Chi, Chi-Chun Liu, Ruilong Xie | 2018-03-27 |
| 9917019 | Strained FinFET device fabrication | Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Stuart A. Sieg | 2018-03-13 |
| 9917196 | Semiconductor device and method of forming the semiconductor device | Marc A. Bergendahl, Gauri Karve, Eric R. Miller, Robert R. Robison, John R. Sporre +1 more | 2018-03-13 |
| 9893166 | Dummy gate formation using spacer pull down hardmask | Marc A. Bergendahl, Kangguo Cheng, Eric R. Miller, John R. Sporre, Sean Teehan | 2018-02-13 |
| 9881937 | Preventing strained fin relaxation | Kangguo Cheng, Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve +3 more | 2018-01-30 |
| 9876074 | Structure and process to tuck fin tips self-aligned to gates | Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Derrick Liu +2 more | 2018-01-23 |
| 9859224 | Registration mark formation during sidewall image transfer process | David J. Conklin, Allen H. Gabor, Sivananda K. Kanakasabapathy, Byeong Y. Kim, Stuart A. Sieg | 2018-01-02 |