| 10157827 |
Semiconductor contact |
Ruilong Xie |
2018-12-18 |
| 10157798 |
Uniform bottom spacers in vertical field effect transistors |
Min Gyu Sung, Ruilong Xie, Tenko Yamashita |
2018-12-18 |
| 10109533 |
Nanosheet devices with CMOS epitaxy and method of forming |
Ruilong Xie, Pietro Montanini, Tenko Yamashita, Nicolas Loubet |
2018-10-23 |
| 10084068 |
Self-aligned finFET formation |
Fee Li Lie, Chi-Chun Liu, Ruilong Xie |
2018-09-25 |
| 9997403 |
Metal layer tip to tip short |
Ruilong Xie |
2018-06-12 |
| 9947548 |
Self-aligned single dummy fin cut with tight pitch |
Kangguo Cheng, Chi-Chun Liu, Peng Xu |
2018-04-17 |
| 9929020 |
Method for fin formation with a self-aligned directed self-assembly process and cut-last scheme |
Fee Li Lie, Chi-Chun Liu, Ruilong Xie |
2018-03-27 |
| 9887133 |
Two-dimensional self-aligned super via integration on self-aligned gate contact |
Ruilong Xie |
2018-02-06 |
